| Presentation | 2006/4/10 Fabrication of low-resistivity ITO film with high electron carrier densities A. Kono, S.N. Luo, T. Murakami, F. Shoji, |
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| PDF Download Page | PDF download Page Link |
| Abstract(in Japanese) | (See Japanese page) |
| Abstract(in English) | Using a low-pressure plasma sputtering method, we prepared the ITO films on glass substrates and investigated the electrical properties as a function of the film thickness. In films prepared on the substrates of 250℃, we realized the low-resistivity ITO film of 1.0×10^<-4>Ωcm at thickness range larger than 200nm. From measurements of Hall mobility and carrier density in the films, it was found that the large increase of carrier density resulted in the low-resistivity. Comparing with the electrical properties of the films prepared on the substrates of "no heating", we suggested that the resistivity improvement is caused by the creation of oxygen vacancies generating anomalous electron carriers in the ITO films. |
| Keyword(in Japanese) | (See Japanese page) |
| Keyword(in English) | Transparent conductive oxide film / ITO film / low-pressure plasma sputtering / Sputtering film |
| Paper # | ED2006-9,SDM2006-9,OME2006-9 |
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| Conference Information | |
| Committee | OME |
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| Conference Date | 2006/4/10(1days) |
| Place (in Japanese) | (See Japanese page) |
| Place (in English) | |
| Topics (in Japanese) | (See Japanese page) |
| Topics (in English) | |
| Chair | |
| Vice Chair | |
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| Paper Information | |
| Registration To | Organic Material Electronics (OME) |
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| Language | JPN |
| Title (in Japanese) | (See Japanese page) |
| Sub Title (in Japanese) | (See Japanese page) |
| Title (in English) | Fabrication of low-resistivity ITO film with high electron carrier densities |
| Sub Title (in English) | |
| Keyword(1) | Transparent conductive oxide film |
| Keyword(2) | ITO film |
| Keyword(3) | low-pressure plasma sputtering |
| Keyword(4) | Sputtering film |
| 1st Author's Name | A. Kono |
| 1st Author's Affiliation | Faculty of Engineering, Kyushyu Kyoritsu University() |
| 2nd Author's Name | S.N. Luo |
| 2nd Author's Affiliation | Liaoning Institute of Technology |
| 3rd Author's Name | T. Murakami |
| 3rd Author's Affiliation | Faculty of Engineering, Kyushyu Kyoritsu University |
| 4th Author's Name | F. Shoji |
| 4th Author's Affiliation | Faculty of Engineering, Kyushyu Kyoritsu University |
| Date | 2006/4/10 |
| Paper # | ED2006-9,SDM2006-9,OME2006-9 |
| Volume (vol) | vol.106 |
| Number (no) | 7 |
| Page | pp.pp.- |
| #Pages | 5 |
| Date of Issue | |