Presentation 2006/3/9
Patterning of Polymeric Materials by Selective Dye-Doping
Toshiko MIZOKURO, Hiroyuki MOCHIZUKI, Xiaoliang Mo, Nobutaka TANIGAKI, Takashi HIRAGA,
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Abstract(in Japanese) (See Japanese page)
Abstract(in English) We report a novel patterning process that adds absorption color and fluorescence to a positive-type photoresist by doping vapor of the dyes, solvent blue 59 (SB59) and 4-(dicyanomethylene)-2-methyl-6-(4-dimethylaminostyryl) 4H-pyran (DCM), using a simple vacuum process called vapor transportation method. Dye-doped photoresist films were examined by UV-vis absorption spectroscopy, fluorescent spectroscopy, and optical microscopy. After the resist film with exposed and unexposed area was contacted with the dye vapor, the exposed area was not changed but the unexposed area assumed color and/or fluorescence of the dye. These results indicated the selective doping of dye vapor into unexposed and exposed areas, dye was doped selectively into the unexposed areas of the films, resulting in the production of micropatterns with dye molecules in the patterned films.
Keyword(in Japanese) (See Japanese page)
Keyword(in English) Vapor / Fluorescence / Photoresist / Patterning / Vacuum / Selective doping / Dye
Paper # OME2005-120
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Conference Information
Committee OME
Conference Date 2006/3/9(1days)
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Registration To Organic Material Electronics (OME)
Language JPN
Title (in Japanese) (See Japanese page)
Sub Title (in Japanese) (See Japanese page)
Title (in English) Patterning of Polymeric Materials by Selective Dye-Doping
Sub Title (in English)
Keyword(1) Vapor
Keyword(2) Fluorescence
Keyword(3) Photoresist
Keyword(4) Patterning
Keyword(5) Vacuum
Keyword(6) Selective doping
Keyword(7) Dye
1st Author's Name Toshiko MIZOKURO
1st Author's Affiliation Photonics Research Institute, National Institute of Advanced Industrial Science and Technology (AIST)()
2nd Author's Name Hiroyuki MOCHIZUKI
2nd Author's Affiliation Photonics Research Institute, National Institute of Advanced Industrial Science and Technology (AIST)
3rd Author's Name Xiaoliang Mo
3rd Author's Affiliation Photonics Research Institute, National Institute of Advanced Industrial Science and Technology (AIST)
4th Author's Name Nobutaka TANIGAKI
4th Author's Affiliation Photonics Research Institute, National Institute of Advanced Industrial Science and Technology (AIST)
5th Author's Name Takashi HIRAGA
5th Author's Affiliation Photonics Research Institute, National Institute of Advanced Industrial Science and Technology (AIST)
Date 2006/3/9
Paper # OME2005-120
Volume (vol) vol.105
Number (no) 660
Page pp.pp.-
#Pages 6
Date of Issue