Presentation | 2006/3/9 Patterning of Polymeric Materials by Selective Dye-Doping Toshiko MIZOKURO, Hiroyuki MOCHIZUKI, Xiaoliang Mo, Nobutaka TANIGAKI, Takashi HIRAGA, |
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Abstract(in Japanese) | (See Japanese page) |
Abstract(in English) | We report a novel patterning process that adds absorption color and fluorescence to a positive-type photoresist by doping vapor of the dyes, solvent blue 59 (SB59) and 4-(dicyanomethylene)-2-methyl-6-(4-dimethylaminostyryl) 4H-pyran (DCM), using a simple vacuum process called vapor transportation method. Dye-doped photoresist films were examined by UV-vis absorption spectroscopy, fluorescent spectroscopy, and optical microscopy. After the resist film with exposed and unexposed area was contacted with the dye vapor, the exposed area was not changed but the unexposed area assumed color and/or fluorescence of the dye. These results indicated the selective doping of dye vapor into unexposed and exposed areas, dye was doped selectively into the unexposed areas of the films, resulting in the production of micropatterns with dye molecules in the patterned films. |
Keyword(in Japanese) | (See Japanese page) |
Keyword(in English) | Vapor / Fluorescence / Photoresist / Patterning / Vacuum / Selective doping / Dye |
Paper # | OME2005-120 |
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Conference Information | |
Committee | OME |
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Conference Date | 2006/3/9(1days) |
Place (in Japanese) | (See Japanese page) |
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Topics (in Japanese) | (See Japanese page) |
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Paper Information | |
Registration To | Organic Material Electronics (OME) |
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Language | JPN |
Title (in Japanese) | (See Japanese page) |
Sub Title (in Japanese) | (See Japanese page) |
Title (in English) | Patterning of Polymeric Materials by Selective Dye-Doping |
Sub Title (in English) | |
Keyword(1) | Vapor |
Keyword(2) | Fluorescence |
Keyword(3) | Photoresist |
Keyword(4) | Patterning |
Keyword(5) | Vacuum |
Keyword(6) | Selective doping |
Keyword(7) | Dye |
1st Author's Name | Toshiko MIZOKURO |
1st Author's Affiliation | Photonics Research Institute, National Institute of Advanced Industrial Science and Technology (AIST)() |
2nd Author's Name | Hiroyuki MOCHIZUKI |
2nd Author's Affiliation | Photonics Research Institute, National Institute of Advanced Industrial Science and Technology (AIST) |
3rd Author's Name | Xiaoliang Mo |
3rd Author's Affiliation | Photonics Research Institute, National Institute of Advanced Industrial Science and Technology (AIST) |
4th Author's Name | Nobutaka TANIGAKI |
4th Author's Affiliation | Photonics Research Institute, National Institute of Advanced Industrial Science and Technology (AIST) |
5th Author's Name | Takashi HIRAGA |
5th Author's Affiliation | Photonics Research Institute, National Institute of Advanced Industrial Science and Technology (AIST) |
Date | 2006/3/9 |
Paper # | OME2005-120 |
Volume (vol) | vol.105 |
Number (no) | 660 |
Page | pp.pp.- |
#Pages | 6 |
Date of Issue |