Presentation 2006/3/7
Crystal and surface structures of GST film and phase-change controlability of lateral type GST phase-change resistor
Sumio HOSAKA, Akihira MIYACHI, You YIN, Daisuke NIIDA, Hayato SONE,
PDF Download Page PDF download Page Link
Abstract(in Japanese) (See Japanese page)
Abstract(in English) We have studied crystal and surface structures of GeSbTe (GST) film using XRD (X ray diffraction) and UHV nc-AFM (Ultrahigh vaccum noncontact mode atomic force microscopy), and have also studied a phase-change controlability of the lateral type GST phase change resistor. As the experimental results, we obtained some knowledge as follows: (1) In annealing process, crystallizing of GST film is FCC structure over 150℃ and then to HEX structure over 335℃ using XRD spectra. (2) Observations of the GST film surfaces have been done by UHV nc-AFM. The observation made it clear that the grain sizes and roughness of the film change before and after annealing. (3) The controlability depends on the phase change resistor size, especially, length and film thickness. (4) The critical phsase change power was 1 or 2 orders magnitude of smaller than the vertical type phase change resistor.
Keyword(in Japanese) (See Japanese page)
Keyword(in English) Phase change memory / phase change material / GeSbTe / PRAM / Nonvolatile memory / nc-AFM / XRD
Paper # SDM2005-259
Date of Issue

Conference Information
Committee SDM
Conference Date 2006/3/7(1days)
Place (in Japanese) (See Japanese page)
Place (in English)
Topics (in Japanese) (See Japanese page)
Topics (in English)
Chair
Vice Chair
Secretary
Assistant

Paper Information
Registration To Silicon Device and Materials (SDM)
Language JPN
Title (in Japanese) (See Japanese page)
Sub Title (in Japanese) (See Japanese page)
Title (in English) Crystal and surface structures of GST film and phase-change controlability of lateral type GST phase-change resistor
Sub Title (in English)
Keyword(1) Phase change memory
Keyword(2) phase change material
Keyword(3) GeSbTe
Keyword(4) PRAM
Keyword(5) Nonvolatile memory
Keyword(6) nc-AFM
Keyword(7) XRD
1st Author's Name Sumio HOSAKA
1st Author's Affiliation Graduate School of Engineering, Gunma University()
2nd Author's Name Akihira MIYACHI
2nd Author's Affiliation Graduate School of Engineering, Gunma University
3rd Author's Name You YIN
3rd Author's Affiliation SVBL, Gunma University
4th Author's Name Daisuke NIIDA
4th Author's Affiliation Graduate School of Engineering, Gunma University
5th Author's Name Hayato SONE
5th Author's Affiliation Graduate School of Engineering, Gunma University
Date 2006/3/7
Paper # SDM2005-259
Volume (vol) vol.105
Number (no) 654
Page pp.pp.-
#Pages 6
Date of Issue