| Presentation | 2006/1/30 Deoxidization of Cu Oxide under Extremely Low Oxygen Pressure Kazuhiko Endo, Naoki Shirakawa, Yoshiyuki Yoshida, Shin-ichi Ikeda, Tetsuya Mino, Eishi Gofuku, Eiichi Suzuki, |
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| PDF Download Page | PDF download Page Link |
| Abstract(in Japanese) | (See Japanese page) |
| Abstract(in English) | Deoxidization of Cu oxide has been carried out in an extremely low oxygen partial pressure atmosphere for the first time. The oxygen was evacuated to 10^<-28> atm by using the newly developed oxygen reduction system. It was experimentally demonstrated that the surface oxide of Cu film was completely removed by exposure to such an environment at 200℃. The proposed deoxidization reaction can be used as a new Cu surface cleaning technique. |
| Keyword(in Japanese) | (See Japanese page) |
| Keyword(in English) | copper / oxide / cleaning / oxygen partial pressure |
| Paper # | SDM2005-254 |
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| Conference Information | |
| Committee | SDM |
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| Conference Date | 2006/1/30(1days) |
| Place (in Japanese) | (See Japanese page) |
| Place (in English) | |
| Topics (in Japanese) | (See Japanese page) |
| Topics (in English) | |
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| Vice Chair | |
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| Paper Information | |
| Registration To | Silicon Device and Materials (SDM) |
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| Language | JPN |
| Title (in Japanese) | (See Japanese page) |
| Sub Title (in Japanese) | (See Japanese page) |
| Title (in English) | Deoxidization of Cu Oxide under Extremely Low Oxygen Pressure |
| Sub Title (in English) | |
| Keyword(1) | copper |
| Keyword(2) | oxide |
| Keyword(3) | cleaning |
| Keyword(4) | oxygen partial pressure |
| 1st Author's Name | Kazuhiko Endo |
| 1st Author's Affiliation | National Institute of Advanced Industrial Science and Technology (AIST)() |
| 2nd Author's Name | Naoki Shirakawa |
| 2nd Author's Affiliation | National Institute of Advanced Industrial Science and Technology (AIST) |
| 3rd Author's Name | Yoshiyuki Yoshida |
| 3rd Author's Affiliation | National Institute of Advanced Industrial Science and Technology (AIST) |
| 4th Author's Name | Shin-ichi Ikeda |
| 4th Author's Affiliation | National Institute of Advanced Industrial Science and Technology (AIST) |
| 5th Author's Name | Tetsuya Mino |
| 5th Author's Affiliation | National Institute of Advanced Industrial Science and Technology (AIST) |
| 6th Author's Name | Eishi Gofuku |
| 6th Author's Affiliation | National Institute of Advanced Industrial Science and Technology (AIST) |
| 7th Author's Name | Eiichi Suzuki |
| 7th Author's Affiliation | National Institute of Advanced Industrial Science and Technology (AIST) |
| Date | 2006/1/30 |
| Paper # | SDM2005-254 |
| Volume (vol) | vol.105 |
| Number (no) | 598 |
| Page | pp.pp.- |
| #Pages | 5 |
| Date of Issue | |