| Presentation | 2006/1/30 Film Characterization and Integration of UV Cured Ultra Low-k for 45nm Node Cu/Low-k Interconnects Kinya Goto, Shinobu Hashii, Masahiro Matsumoto, Noriko Miura, Takeshi Furusawa, Masazumi Matsuura, Akihiko Ohsaki, |
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| PDF Download Page | PDF download Page Link |
| Abstract(in Japanese) | (See Japanese page) |
| Abstract(in English) | In order to obtain reliable Cu/Low-k interconnect systems, we have investigated the curing mechanisms of UV on Low-k films. By using optimized cure conditions, the Low-k film characteristics improved significantly. In this paper, we discuss the UV cure mechanisms focused on the bond structure in UV cured Low-k films in detail, using the FT-IR and NMR methods. We present the comparison results of 2 types of UV lamps and suggest the successful choice of UV lamp. We also mention the improved adhesion of film stack structure when using UV cure. Finally, by using UV cured ULK, a high performance Cu/Low-k interconnect was realized without the inclusion of a high-k capping layer. |
| Keyword(in Japanese) | (See Japanese page) |
| Keyword(in English) | UV / ultra violet / cure / Low-k / ULK / SiCN / SiCO / modulus / k-value |
| Paper # | SDM2005-250 |
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| Conference Information | |
| Committee | SDM |
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| Conference Date | 2006/1/30(1days) |
| Place (in Japanese) | (See Japanese page) |
| Place (in English) | |
| Topics (in Japanese) | (See Japanese page) |
| Topics (in English) | |
| Chair | |
| Vice Chair | |
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| Paper Information | |
| Registration To | Silicon Device and Materials (SDM) |
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| Language | JPN |
| Title (in Japanese) | (See Japanese page) |
| Sub Title (in Japanese) | (See Japanese page) |
| Title (in English) | Film Characterization and Integration of UV Cured Ultra Low-k for 45nm Node Cu/Low-k Interconnects |
| Sub Title (in English) | |
| Keyword(1) | UV |
| Keyword(2) | ultra violet |
| Keyword(3) | cure |
| Keyword(4) | Low-k |
| Keyword(5) | ULK |
| Keyword(6) | SiCN |
| Keyword(7) | SiCO |
| Keyword(8) | modulus |
| Keyword(9) | k-value |
| 1st Author's Name | Kinya Goto |
| 1st Author's Affiliation | Renesas Technology Corp.() |
| 2nd Author's Name | Shinobu Hashii |
| 2nd Author's Affiliation | Renesas Semiconductor Engineering Corp. |
| 3rd Author's Name | Masahiro Matsumoto |
| 3rd Author's Affiliation | Renesas Technology Corp. |
| 4th Author's Name | Noriko Miura |
| 4th Author's Affiliation | Renesas Technology Corp. |
| 5th Author's Name | Takeshi Furusawa |
| 5th Author's Affiliation | Renesas Technology Corp. |
| 6th Author's Name | Masazumi Matsuura |
| 6th Author's Affiliation | Renesas Technology Corp. |
| 7th Author's Name | Akihiko Ohsaki |
| 7th Author's Affiliation | Renesas Technology Corp. |
| Date | 2006/1/30 |
| Paper # | SDM2005-250 |
| Volume (vol) | vol.105 |
| Number (no) | 598 |
| Page | pp.pp.- |
| #Pages | 5 |
| Date of Issue | |