Presentation 2006-01-27
Fluoride based Resonant Tunneling Diode on Si(100) substrate using Nanoarea Local Growth
Tohru KANAZAWA, Atsushi MOROSAWA, Ryo FUJII, Takafumi WADA, Masahiro WATANABE, Masahiro ASADA,
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Abstract(in English) A CdF_2/CaF_2 heterostructure is an attractive candidate for quantum applications on Si substrates, such as resonant tunneling diodes (RTDs) and quantum intersubband transition devices, because of the large conduction band discontinuity (ΔEc~2.9eV) at the heterointerface. We have observed clear NDR with high PVCR for fluoride-based DBRTDs on Si(100) substrates by nanoarea local epitaxy. Crystal growth areas were limited by 15-nm-thick SiO_2 insulator layer and holes with a diameter of 80nm were observed. And bottom CaF_2 layer was post-growth annealed at 500℃. The PVCR obtained was more than 10^6, Which is the highest for fluoride-based RTDs on Si(100) substrates.
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Keyword(in English) RTD / NDR / quantum / CaF_2 / CdF_2 / Silicon
Paper # ED2005-233,SDM2005-245
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Committee SDM
Conference Date 2006/1/20(1days)
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Registration To Silicon Device and Materials (SDM)
Language JPN
Title (in Japanese) (See Japanese page)
Sub Title (in Japanese) (See Japanese page)
Title (in English) Fluoride based Resonant Tunneling Diode on Si(100) substrate using Nanoarea Local Growth
Sub Title (in English)
Keyword(1) RTD
Keyword(2) NDR
Keyword(3) quantum
Keyword(4) CaF_2
Keyword(5) CdF_2
Keyword(6) Silicon
1st Author's Name Tohru KANAZAWA
1st Author's Affiliation Interdisciplinary Graduate School of Science and Engineering, Tokyo Tech()
2nd Author's Name Atsushi MOROSAWA
2nd Author's Affiliation Interdisciplinary Graduate School of Science and Engineering, Tokyo Tech
3rd Author's Name Ryo FUJII
3rd Author's Affiliation Interdisciplinary Graduate School of Science and Engineering, Tokyo Tech
4th Author's Name Takafumi WADA
4th Author's Affiliation Interdisciplinary Graduate School of Science and Engineering, Tokyo Tech
5th Author's Name Masahiro WATANABE
5th Author's Affiliation Interdisciplinary Graduate School of Science and Engineering, Tokyo Tech:SORST-JST
6th Author's Name Masahiro ASADA
6th Author's Affiliation Interdisciplinary Graduate School of Science and Engineering, Tokyo Tech
Date 2006-01-27
Paper # ED2005-233,SDM2005-245
Volume (vol) vol.105
Number (no) 552
Page pp.pp.-
#Pages 4
Date of Issue