Presentation 2006-01-19
C-V characterization of GaN based MIS structures at high temperatures
Hiroki Kato, Marcin Miczek, Tamotsu Hashizume,
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Abstract(in English) To investigate interface properties of GaN-based MIS structures, capacitance-voltage (CV) characterization was carried out under high temperatures and UV illumination. A SiO_2/GaN structure showed a pronounced decrease in slope of capacitance variation and an increase in capacitance at the depletion region at high temperatures as well as a large hysteresis in the CV curve under UV illumination. These are probably caused by a response of interface states near midgap. Then we fabricated a SiO_2/ultrathin AlO_x/GaN structure. An ultrathin AlO_x layer was prepared on GaN surface by molecular beam deposition of Al and UHV annealing. The MIS structure with an ultrathin AlO_x interlayer gave a good CV curve close to the calculated one.
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Keyword(in English) GaN / MIS / CV / high temperature / UV / SiO_2 / Al_2O_3
Paper # ED2005-201,MW2005-155
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Conference Date 2006/1/12(1days)
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Language JPN
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Title (in English) C-V characterization of GaN based MIS structures at high temperatures
Sub Title (in English)
Keyword(1) GaN
Keyword(2) MIS
Keyword(3) CV
Keyword(4) high temperature
Keyword(5) UV
Keyword(6) SiO_2
Keyword(7) Al_2O_3
1st Author's Name Hiroki Kato
1st Author's Affiliation Research Center for Quantum Electronics, Hokkaido University()
2nd Author's Name Marcin Miczek
2nd Author's Affiliation Research Center for Quantum Electronics, Hokkaido University
3rd Author's Name Tamotsu Hashizume
3rd Author's Affiliation Research Center for Quantum Electronics, Hokkaido University
Date 2006-01-19
Paper # ED2005-201,MW2005-155
Volume (vol) vol.105
Number (no) 524
Page pp.pp.-
#Pages 4
Date of Issue