Presentation 2006-01-19
High Power AlGaN/GaN MIS-HEMT
Masahito KANAMURA, Toshihide KIKKAWA, Taisuke IWAI, Kenji IMANISHI, Tokuro KUBO, Kazukiyo JOSHIN,
PDF Download Page PDF download Page Link
Abstract(in Japanese) (See Japanese page)
Abstract(in English) A state-of-the-art large gate-periphery n-GaN/n-AlGaN/GaN MIS-HEMTs were fabricated on a S.I.-SiC substrate. The forward gate leakage current of the GaN MIS-HEMT was eighth orders of magnitude lower than that of the Schottky gate HEMT and the 2-terminal gate to drain reverse breakdown voltage of the GaN MIS-HEMT reaches greater than 400V. The single chip GaN MIS-HEMT amplifier operated at 60V achieves a high output power of 110W at 2.14GHz.
Keyword(in Japanese) (See Japanese page)
Keyword(in English) AlGaN/GaN HEMT / Base Station / MIS / Si_3N_4
Paper # ED2005-208,MW2005-162
Date of Issue

Conference Information
Committee ED
Conference Date 2006/1/12(1days)
Place (in Japanese) (See Japanese page)
Place (in English)
Topics (in Japanese) (See Japanese page)
Topics (in English)
Chair
Vice Chair
Secretary
Assistant

Paper Information
Registration To Electron Devices (ED)
Language JPN
Title (in Japanese) (See Japanese page)
Sub Title (in Japanese) (See Japanese page)
Title (in English) High Power AlGaN/GaN MIS-HEMT
Sub Title (in English)
Keyword(1) AlGaN/GaN HEMT
Keyword(2) Base Station
Keyword(3) MIS
Keyword(4) Si_3N_4
1st Author's Name Masahito KANAMURA
1st Author's Affiliation Fujitsu Laboratories Ltd.()
2nd Author's Name Toshihide KIKKAWA
2nd Author's Affiliation Fujitsu Laboratories Ltd.
3rd Author's Name Taisuke IWAI
3rd Author's Affiliation Fujitsu Laboratories Ltd.
4th Author's Name Kenji IMANISHI
4th Author's Affiliation Fujitsu Laboratories Ltd.
5th Author's Name Tokuro KUBO
5th Author's Affiliation Fujitsu Laboratories Ltd.
6th Author's Name Kazukiyo JOSHIN
6th Author's Affiliation Fujitsu Laboratories Ltd.
Date 2006-01-19
Paper # ED2005-208,MW2005-162
Volume (vol) vol.105
Number (no) 521
Page pp.pp.-
#Pages 5
Date of Issue