| Presentation | 2002/6/24 Effect of Time-varying Axial Magnetic Field on High Aspect Ratio SiO_2 Etching in an Inductively Coupled Plasma Ho-Young Song, Yong-Hee Choi, Se-Geun Park, Beom-hoan O, Jin-Sung Oh, Jin-Woong Kim, |
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| PDF Download Page | PDF download Page Link |
| Abstract(in Japanese) | (See Japanese page) |
| Abstract(in English) | Low frequency weak magnetic field is applied axially to an inductively coupled plasma (ICP). Efficient power transfer from RF source to plasma is enhanced by the axial magnetic field. High aspect ratio deep-sub-micron contact holes in BPSG have been etched by C_4F_8/Ar plasma. The role of deposition of polymeric precursors in the etching process is monitored. By means of appearance mass spectroscopy (AMS), the distributions of fluorocarbon ions (CF_X^+; x=1-3) and CF_X radicals are measured as a function of magnetization frequency. The axial magnetic field is found to influence the densities of CF_X ions and F and CF_X radicals. X-ray photoelectron spectroscopy (XPS) shows that fluorocarbon polymer on BPSG layer strongly varies with the magnetization frequency. Contact holes of 0.1 μm diameter with aspect ratio of 10 are successfully fabricated in this system. |
| Keyword(in Japanese) | (See Japanese page) |
| Keyword(in English) | ICP / High aspect ratio contact hole etching / C_4F_8/Ar plasma / AMS / XPS |
| Paper # | ED2002-145 |
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| Conference Information | |
| Committee | ED |
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| Conference Date | 2002/6/24(1days) |
| Place (in Japanese) | (See Japanese page) |
| Place (in English) | |
| Topics (in Japanese) | (See Japanese page) |
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| Paper Information | |
| Registration To | Electron Devices (ED) |
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| Language | ENG |
| Title (in Japanese) | (See Japanese page) |
| Sub Title (in Japanese) | (See Japanese page) |
| Title (in English) | Effect of Time-varying Axial Magnetic Field on High Aspect Ratio SiO_2 Etching in an Inductively Coupled Plasma |
| Sub Title (in English) | |
| Keyword(1) | ICP |
| Keyword(2) | High aspect ratio contact hole etching |
| Keyword(3) | C_4F_8/Ar plasma |
| Keyword(4) | AMS |
| Keyword(5) | XPS |
| 1st Author's Name | Ho-Young Song |
| 1st Author's Affiliation | m-PARC, School of Information and Communication Engineering Inha University() |
| 2nd Author's Name | Yong-Hee Choi |
| 2nd Author's Affiliation | m-PARC, School of Information and Communication Engineering Inha University |
| 3rd Author's Name | Se-Geun Park |
| 3rd Author's Affiliation | m-PARC, School of Information and Communication Engineering Inha University |
| 4th Author's Name | Beom-hoan O |
| 4th Author's Affiliation | m-PARC, School of Information and Communication Engineering Inha University |
| 5th Author's Name | Jin-Sung Oh |
| 5th Author's Affiliation | R&D Division, Hynix Semiconductor Inc. |
| 6th Author's Name | Jin-Woong Kim |
| 6th Author's Affiliation | R&D Division, Hynix Semiconductor Inc. |
| Date | 2002/6/24 |
| Paper # | ED2002-145 |
| Volume (vol) | vol.102 |
| Number (no) | 175 |
| Page | pp.pp.- |
| #Pages | 5 |
| Date of Issue | |