Presentation | 2005-11-25 Evaluation Technique in Low-Temperature Polycrystalline Silicon Thin Film Transistors Yukiharu Uraoka, Takashi Fuyuki, |
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Abstract(in Japanese) | (See Japanese page) |
Abstract(in English) | Low-temperature polycrystalline silicon thin-film-transistor gathers much attention for realizing system on panel. Improving its reliability is very important as well as performance. In this study, we propose reliability evaluation technique to improve the reliability. We analyzed thermal degradation in low temperature poly-Si thin film transistors using infrared thermal imaging microscope. Non-uniform distribution was observed in saturation region along the gate length. Increase of temperature was remarkable in wide gate width, therefore large voltage shift was observed. TFTs with different source and drain wiring indicated different temperature increase, subsequently, different reliability was confirmed. Universal relationship was obtained independent of crystallinity of poly-Si. This curve suggested that we should take the degradation of gate oxide such as electron traps into account. In order to realize the future display, this method will be very effective to improve the reliability. |
Keyword(in Japanese) | (See Japanese page) |
Keyword(in English) | low temperature poly-Si / Joule Heating / Vth shift / infrared thermal imaging scope |
Paper # | R2005-38,ED2005-173,SDM2005-192 |
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Conference Information | |
Committee | R |
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Conference Date | 2005/11/18(1days) |
Place (in Japanese) | (See Japanese page) |
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Topics (in Japanese) | (See Japanese page) |
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Paper Information | |
Registration To | Reliability(R) |
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Language | JPN |
Title (in Japanese) | (See Japanese page) |
Sub Title (in Japanese) | (See Japanese page) |
Title (in English) | Evaluation Technique in Low-Temperature Polycrystalline Silicon Thin Film Transistors |
Sub Title (in English) | |
Keyword(1) | low temperature poly-Si |
Keyword(2) | Joule Heating |
Keyword(3) | Vth shift |
Keyword(4) | infrared thermal imaging scope |
1st Author's Name | Yukiharu Uraoka |
1st Author's Affiliation | Nara Institute of Science and Technology() |
2nd Author's Name | Takashi Fuyuki |
2nd Author's Affiliation | Nara Institute of Science and Technology |
Date | 2005-11-25 |
Paper # | R2005-38,ED2005-173,SDM2005-192 |
Volume (vol) | vol.105 |
Number (no) | 434 |
Page | pp.pp.- |
#Pages | 6 |
Date of Issue |