Presentation 2005-11-17
A K-band AlGaN/GaN HFET MMIC Amplifier on Sapphire using novel superlattice cap layer
Masaaki NISHIJIMA, Tomohiro MURATA, Masahiro HIKITA, Yutaka HIROSE, Noboru NEGORO, Hiroyuki SAKAI, Kaoru INOUE, Yasuhiro UEMOTO, Tsuyoshi TANAKA, Daisuke UEDA,
PDF Download Page PDF download Page Link
Abstract(in Japanese) (See Japanese page)
Abstract(in English) We have developed a K-band AlGaN/GaN HFET MMIC amplifier by applying an AlGaN/GaN superlattice (SL) capped structure on sapphire substrate. Owing to the lowest (0.4Ω・mm) source resistance of AlGaN/GaN HFETs, the HFETs exhibited excellent DC and RF characteristics, and sufficient ability to operate in the K-band frequency range is obtained. The fabricated MMIC with a CPW-line structure exhibited a small-signal gain higher than 10dB with a 3-dB bandwidth of 20-24.5GHz and that of 13dB at 21.6GHz when biased at a supply voltage of 7V. The 1dB compression point (P_<1dB>) referred to output of 15.4dBm at 21.6GHz was obtained. This work is the first report of MMIC amplifier fabricated on sapphire successfully operating in the K band.
Keyword(in Japanese) (See Japanese page)
Keyword(in English) AlGaN/GaN heterojunction FET / superlattices / MMIC amplifiers / Coplanar waveguides / Sapphire / SiC / source resistance / two-dimensional electron gas (2DEG) / polarization charge
Paper # ED2005-165,MW2005-120
Date of Issue

Conference Information
Committee ED
Conference Date 2005/11/10(1days)
Place (in Japanese) (See Japanese page)
Place (in English)
Topics (in Japanese) (See Japanese page)
Topics (in English)
Chair
Vice Chair
Secretary
Assistant

Paper Information
Registration To Electron Devices (ED)
Language JPN
Title (in Japanese) (See Japanese page)
Sub Title (in Japanese) (See Japanese page)
Title (in English) A K-band AlGaN/GaN HFET MMIC Amplifier on Sapphire using novel superlattice cap layer
Sub Title (in English)
Keyword(1) AlGaN/GaN heterojunction FET
Keyword(2) superlattices
Keyword(3) MMIC amplifiers
Keyword(4) Coplanar waveguides
Keyword(5) Sapphire
Keyword(6) SiC
Keyword(7) source resistance
Keyword(8) two-dimensional electron gas (2DEG)
Keyword(9) polarization charge
1st Author's Name Masaaki NISHIJIMA
1st Author's Affiliation Semiconductor Device Research Center, Semiconductor Company, Matsushita Electric Industrial Co., Ltd.()
2nd Author's Name Tomohiro MURATA
2nd Author's Affiliation Semiconductor Device Research Center, Semiconductor Company, Matsushita Electric Industrial Co., Ltd.
3rd Author's Name Masahiro HIKITA
3rd Author's Affiliation Semiconductor Device Research Center, Semiconductor Company, Matsushita Electric Industrial Co., Ltd.
4th Author's Name Yutaka HIROSE
4th Author's Affiliation Semiconductor Device Research Center, Semiconductor Company, Matsushita Electric Industrial Co., Ltd.
5th Author's Name Noboru NEGORO
5th Author's Affiliation Semiconductor Device Research Center, Semiconductor Company, Matsushita Electric Industrial Co., Ltd.
6th Author's Name Hiroyuki SAKAI
6th Author's Affiliation Semiconductor Device Research Center, Semiconductor Company, Matsushita Electric Industrial Co., Ltd.
7th Author's Name Kaoru INOUE
7th Author's Affiliation Semiconductor Device Research Center, Semiconductor Company, Matsushita Electric Industrial Co., Ltd.
8th Author's Name Yasuhiro UEMOTO
8th Author's Affiliation Semiconductor Device Research Center, Semiconductor Company, Matsushita Electric Industrial Co., Ltd.
9th Author's Name Tsuyoshi TANAKA
9th Author's Affiliation Semiconductor Device Research Center, Semiconductor Company, Matsushita Electric Industrial Co., Ltd.
10th Author's Name Daisuke UEDA
10th Author's Affiliation Semiconductor Device Research Center, Semiconductor Company, Matsushita Electric Industrial Co., Ltd.
Date 2005-11-17
Paper # ED2005-165,MW2005-120
Volume (vol) vol.105
Number (no) 400
Page pp.pp.-
#Pages 5
Date of Issue