Presentation 2005/10/6
Short-gate AlGaN/GaN HFETs with extremely thin AlGaN barriers for millimeter-wave operations
Masataka HIGASHIWAKI, Norio ONOJIMA, Toshiaki MATSUI,
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Abstract(in English) We have succeeded in suppressing short-channel effects by using high-Al-composition and extremely thin AlGaN barrier layers to improve high-frequency characteristics of sub-0.1-μm AlGaN/GaN heterostructure field-effect transistors (HFETs). The devices had maximum drain current densities of 1.1-1.2A/mm and peak extrinsic transconductances of 305-441mS/mm. The current-gain cutoff frequency (f_T) of 163GHz and maximum oscillation frequency (f_) of 192GHz were obtained for the 8-nm-AlGaN-barrier devices with 0.06- and 0.08-μm-long gates, respectively.
Keyword(in Japanese) (See Japanese page)
Keyword(in English) GaN / heterostructure field-effect transistor (HFET) / current-gain cutoff frequency (f_T) / maximum oscillation frequency (f_)
Paper # ED2005-138,CPM2005-125,LQE005-65
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Committee ED
Conference Date 2005/10/6(1days)
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Registration To Electron Devices (ED)
Language JPN
Title (in Japanese) (See Japanese page)
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Title (in English) Short-gate AlGaN/GaN HFETs with extremely thin AlGaN barriers for millimeter-wave operations
Sub Title (in English)
Keyword(1) GaN
Keyword(2) heterostructure field-effect transistor (HFET)
Keyword(3) current-gain cutoff frequency (f_T)
Keyword(4) maximum oscillation frequency (f_)
1st Author's Name Masataka HIGASHIWAKI
1st Author's Affiliation Millimeter-wave Devices Group, National Institute of Information and Communications Technology (NICT)()
2nd Author's Name Norio ONOJIMA
2nd Author's Affiliation Millimeter-wave Devices Group, National Institute of Information and Communications Technology (NICT)
3rd Author's Name Toshiaki MATSUI
3rd Author's Affiliation Millimeter-wave Devices Group, National Institute of Information and Communications Technology (NICT)
Date 2005/10/6
Paper # ED2005-138,CPM2005-125,LQE005-65
Volume (vol) vol.105
Number (no) 325
Page pp.pp.-
#Pages 4
Date of Issue