Presentation 2005/10/6
Surface acoustic wave device characteristics fabricated on n^+GaN/undoped GaN structures
Naoteru SHIGEKAWA, Kazumi NISHIMURA, Haruki YOKOYAMA, Kohji HOHKAWA,
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Abstract(in English) We removed the top n^+GaN layers of n^+GaN/undoped GaN structures grown on (0001) sapphire substrates by Cl_2-based inductively-coupled plasma etching, and fabricated surface acoustic wave (SAW) filters on the exposed surfaces of the undoped GaN layers. We found that their characteristics are similar to those of filters on as-grown undoped GaN layers. This result indicates that GaN-based SAW devices and electron devices such as FET can be fabricated on the same wafers. Characteristics of SAW filters that employ n^+GaN layers as electrodes, and results of sensing hydrogen using SAW-based delay-line oscillators, which were composed as a prototype of functional devices, are also discussed.
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Keyword(in English) GaN / Surface acoustic wave / SAW / ICP etching / Hydrogen sensor
Paper # ED2005-136,CPM2005-123,LQE005-63
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Committee ED
Conference Date 2005/10/6(1days)
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Registration To Electron Devices (ED)
Language JPN
Title (in Japanese) (See Japanese page)
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Title (in English) Surface acoustic wave device characteristics fabricated on n^+GaN/undoped GaN structures
Sub Title (in English)
Keyword(1) GaN
Keyword(2) Surface acoustic wave
Keyword(3) SAW
Keyword(4) ICP etching
Keyword(5) Hydrogen sensor
1st Author's Name Naoteru SHIGEKAWA
1st Author's Affiliation Photonics Laboratories, Nippon Telegraph and Telephone Corporation()
2nd Author's Name Kazumi NISHIMURA
2nd Author's Affiliation Photonics Laboratories, Nippon Telegraph and Telephone Corporation
3rd Author's Name Haruki YOKOYAMA
3rd Author's Affiliation Photonics Laboratories, Nippon Telegraph and Telephone Corporation
4th Author's Name Kohji HOHKAWA
4th Author's Affiliation Department of Engineering, Kanagawa Institute of Technology
Date 2005/10/6
Paper # ED2005-136,CPM2005-123,LQE005-63
Volume (vol) vol.105
Number (no) 325
Page pp.pp.-
#Pages 4
Date of Issue