| Presentation | 2005/10/6 High-quality InN grown on micro-facetted InN template Daisuke MUTO, Hiroyuki NAOI, Tsutomu ARAKI, Sachio KITAGAWA, Masahito KUROUCHI, Hyunseok NA, Yasushi NANISHI, |
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| PDF Download Page | PDF download Page Link |
| Abstract(in Japanese) | (See Japanese page) |
| Abstract(in English) | We have succeeded in dramatically decreasing the density of dislocations in InN by regrowing InN films on micro-facetted N-polar InN templates. The micro-facetted N-polar InN templates were formed by wet etching in a 10mol/l KOH solution. InN films were regrown on the micro-facetted N-polar InN templates and on flat surface N-polar InN templates for comparison by radio-frequency plasma-assisted molecular beam epitaxy. InN regrown on micro-facetted InN had considerably smaller twist distribution than that grown on the flat InN templates. Moreover, the InN grown on the micro-facetted InN had much lower dislocation density than that grown on the flat InN templates by the termination of dislocations at the interface between the regrown InN and the micro-facetted InN template. Based on the results, we propose that regrowth of InN on micro-facetted InN templates is an effective way to obtain high-quality InN films. |
| Keyword(in Japanese) | (See Japanese page) |
| Keyword(in English) | InN / Threading dislocation / Wet etching / KOH / RF-MBE |
| Paper # | ED2005-118,CPM2005-105,LQE005-45 |
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| Conference Information | |
| Committee | ED |
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| Conference Date | 2005/10/6(1days) |
| Place (in Japanese) | (See Japanese page) |
| Place (in English) | |
| Topics (in Japanese) | (See Japanese page) |
| Topics (in English) | |
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| Vice Chair | |
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| Paper Information | |
| Registration To | Electron Devices (ED) |
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| Language | JPN |
| Title (in Japanese) | (See Japanese page) |
| Sub Title (in Japanese) | (See Japanese page) |
| Title (in English) | High-quality InN grown on micro-facetted InN template |
| Sub Title (in English) | |
| Keyword(1) | InN |
| Keyword(2) | Threading dislocation |
| Keyword(3) | Wet etching |
| Keyword(4) | KOH |
| Keyword(5) | RF-MBE |
| 1st Author's Name | Daisuke MUTO |
| 1st Author's Affiliation | Department of Photonics, Ritsumeikan University() |
| 2nd Author's Name | Hiroyuki NAOI |
| 2nd Author's Affiliation | Center for Promotion of the COE Program, Ritsumeikan University |
| 3rd Author's Name | Tsutomu ARAKI |
| 3rd Author's Affiliation | Department of Photonics, Ritsumeikan University |
| 4th Author's Name | Sachio KITAGAWA |
| 4th Author's Affiliation | Department of Photonics, Ritsumeikan University |
| 5th Author's Name | Masahito KUROUCHI |
| 5th Author's Affiliation | Department of Photonics, Ritsumeikan University |
| 6th Author's Name | Hyunseok NA |
| 6th Author's Affiliation | Center for Promotion of the COE Program, Ritsumeikan University |
| 7th Author's Name | Yasushi NANISHI |
| 7th Author's Affiliation | Department of Photonics, Ritsumeikan University |
| Date | 2005/10/6 |
| Paper # | ED2005-118,CPM2005-105,LQE005-45 |
| Volume (vol) | vol.105 |
| Number (no) | 325 |
| Page | pp.pp.- |
| #Pages | 4 |
| Date of Issue | |