Presentation 2005/9/30
Theoretical Investigation on Degradation Process of MgO Protecting Layer in Plasma Display and Design of New MgO Protecting Layer
Momoji KUBO, Hiromi KIKUCHI, Hideyuki TSUBOI, Michihisa KOYAMA, Akira ENDOU, CARPIO Carlos A. DEL, Akira MIYAMOTO,
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Abstract(in Japanese) (See Japanese page)
Abstract(in English) Increment of stability of MgO protecting layer under the plasma condition is strongly demanded for the development of next-generation plasma display. Hence, in the present study, we employed our tight-binding quantum chemical molecular dynamics and molecular dynamics programs to investigate the degradation process of MgO protecting layer under the Xe irradiation condition. We found that the elucidation of the recrystalization process of MgO protecting layer is important in addition to its destruction process. Moreover, we pointed out that the different recrystalzation processes occur on the MgO(001), (011) and (111) surfaces.
Keyword(in Japanese) (See Japanese page)
Keyword(in English) Quantum Chemical Molecular Dynamics / Molecular Dynamics / Plasma Display / MgO Protecting Layer / Degradation Process
Paper # SDM2005-188
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Committee SDM
Conference Date 2005/9/30(1days)
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Registration To Silicon Device and Materials (SDM)
Language JPN
Title (in Japanese) (See Japanese page)
Sub Title (in Japanese) (See Japanese page)
Title (in English) Theoretical Investigation on Degradation Process of MgO Protecting Layer in Plasma Display and Design of New MgO Protecting Layer
Sub Title (in English)
Keyword(1) Quantum Chemical Molecular Dynamics
Keyword(2) Molecular Dynamics
Keyword(3) Plasma Display
Keyword(4) MgO Protecting Layer
Keyword(5) Degradation Process
1st Author's Name Momoji KUBO
1st Author's Affiliation Graduate School of Engineering, Tohoku University:PRESTO, Japan Science and Technology Agency()
2nd Author's Name Hiromi KIKUCHI
2nd Author's Affiliation Graduate School of Engineering, Tohoku University
3rd Author's Name Hideyuki TSUBOI
3rd Author's Affiliation Graduate School of Engineering, Tohoku University
4th Author's Name Michihisa KOYAMA
4th Author's Affiliation Graduate School of Engineering, Tohoku University
5th Author's Name Akira ENDOU
5th Author's Affiliation Institute of Fluid Science, Tohoku University
6th Author's Name CARPIO Carlos A. DEL
6th Author's Affiliation Graduate School of Engineering, Tohoku University
7th Author's Name Akira MIYAMOTO
7th Author's Affiliation Graduate School of Engineering, Tohoku University:New Industry Creation Hatchery Center, Tohoku University
Date 2005/9/30
Paper # SDM2005-188
Volume (vol) vol.105
Number (no) 318
Page pp.pp.-
#Pages 2
Date of Issue