| 講演名 | 2002/6/26 The Multi Arrayed Micro-scale Electron Optical System for Electron Beam Lithography using MEMS Technology , |
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| PDFダウンロードページ | PDFダウンロードページへ |
| 抄録(和) | |
| 抄録(英) | This paper presents a electron-beam lithography with 3 x 3 arrayed micro-scale electron optical system to achieve high throughput using MEMS(Micro-Electro-Mechanical Systems) technology. Electron beam lithography is a strong candidate for NGL(next generation lithography) technology. However, throughput of the electron beam lithography is a serious problem. The concept of the arrayed micro-scale electron optical system to improve throughput was introduced. But, because of a large number of components, the system has also several problems that wiring between the components is complicated and the integration of each module is very difficult. This paper presents a 3 x 3 multiple arrayed micro scale electron optical system and its fabrication process using double metallization process. The double metallization process is newly introduced interconnection method for reduced wiring among the components. For realized the arrayed microcolumn system, the multi arrayed field emission tip, the multi arrayed deflector introduced double metallization process and arrayed einzel lens were fabricated using novel anodic bonding process and deep silicon etching process. Finally, We assembled each components using anodic bonding technique. Moreover, A difference of signal delay between pad site and each deflector poles caused by multi interconnection structure was calculated using the SPICE simulator with equivalent circuit model. The calculation results were obtained about 3ns signal delay difference. Therefore, in these arrayed system, this method is very useful for check the signal delay difference. |
| キーワード(和) | |
| キーワード(英) | Electron-beam lithography / microcolumn / electron optics / MEMS / Field emission tip / deflector / arrayed multi beam |
| 資料番号 | SDM2002-128 |
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| 研究会情報 | |
| 研究会 | SDM |
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| 開催期間 | 2002/6/26(から1日開催) |
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| 講演論文情報詳細 | |
| 申込み研究会 | Silicon Device and Materials (SDM) |
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| 本文の言語 | ENG |
| タイトル（和） | |
| サブタイトル（和） | |
| タイトル（英） | The Multi Arrayed Micro-scale Electron Optical System for Electron Beam Lithography using MEMS Technology |
| サブタイトル（和） | |
| キーワード(1)（和/英） | / Electron-beam lithography |
| 第 1 著者 氏名（和/英） | / Hak KIM |
| 第 1 著者 所属（和/英） | Department of Electrical Engineering and Computer Science(#038) and Inter-university Semiconductor Research Center, Seoul National University |
| 発表年月日 | 2002/6/26 |
| 資料番号 | SDM2002-128 |
| 巻番号（vol） | vol.102 |
| 号番号（no） | 180 |
| ページ範囲 | pp.- |
| ページ数 | 5 |
| 発行日 | |