Presentation 2002/8/23
Evaluation of GaN Crystal Quality by using Sub-micron Schottky Contacts : Correlation between Defects and I-V Characteristics of Low-carrier Density n-GaN
Kenji SHIOJIMA, Tetsuya SUEMITSU,
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Abstract(in English) We directly evaluated the effect of dislocations on I-V characteristics of Au/Ni/n-GaN Schottky contacts. A sub-micrometer Schottky dot array was formed by electron beam lithography and I-V measurements were conducted using AFM with a. conductive probe. Neither mixed nor pure edge dislocations affect the I-V characteristics. These results indicate that, in fabricating short-gate FETs, gate Schottky contacts containing dislocations should not be considered a problem with respect to uniformity and reproducibility.
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Keyword(in English) GaN / sub-micron Schottky contact / dislocation / I-V characteristics / AFM
Paper # ED2002-191
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Committee ED
Conference Date 2002/8/23(1days)
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Language JPN
Title (in Japanese) (See Japanese page)
Sub Title (in Japanese) (See Japanese page)
Title (in English) Evaluation of GaN Crystal Quality by using Sub-micron Schottky Contacts : Correlation between Defects and I-V Characteristics of Low-carrier Density n-GaN
Sub Title (in English)
Keyword(1) GaN
Keyword(2) sub-micron Schottky contact
Keyword(3) dislocation
Keyword(4) I-V characteristics
Keyword(5) AFM
1st Author's Name Kenji SHIOJIMA
1st Author's Affiliation NTT Photonics Laboratories()
2nd Author's Name Tetsuya SUEMITSU
2nd Author's Affiliation NTT Photonics Laboratories
Date 2002/8/23
Paper # ED2002-191
Volume (vol) vol.102
Number (no) 294
Page pp.pp.-
#Pages 4
Date of Issue