| Presentation | 2002/8/2 High Rate Deposition of ITO thin Films by Facing Target Sputtering at Low Substrate Tempreature Yoichi HOSHI, Hiroomi KATO, |
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| PDF Download Page | PDF download Page Link |
| Abstract(in Japanese) | (See Japanese page) |
| Abstract(in English) | It is well known that suppression of the bombardment of high energy particles is necessary to obtain ITO thin films with low resistivity at a low substrate temperature. In facing target sputtering(FTS) method, bombardment of film surfaces by high energy oxygen atoms which are produced from negative oxygen ions emitted from the target surface can be completely suppressed. Therefore, sputtering can be performed at a higher sputtering voltages in the FTS than in magnetron sputtering, which is suitable to realize a high deposition rate in the film preparation. In this study, high rate deposition of ITO thin films at a low substrate temperature was attempted by using the FTS technique. As a result, deposition rate as high as 120 nm/min was easily realized by using FTS. Resistivity of the film depended little on the deposition rate and the films with resistivity below 4×10^<-4>Ωcm were obtained, although surface smoothness of the film was degraded by the increase in the deposition rate. |
| Keyword(in Japanese) | (See Japanese page) |
| Keyword(in English) | Facing target sputtering / ITO / transparent conductive thin films / high rate deposition / low temperature deposition |
| Paper # | CPM2002-61 |
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| Conference Information | |
| Committee | CPM |
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| Conference Date | 2002/8/2(1days) |
| Place (in Japanese) | (See Japanese page) |
| Place (in English) | |
| Topics (in Japanese) | (See Japanese page) |
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| Vice Chair | |
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| Paper Information | |
| Registration To | Component Parts and Materials (CPM) |
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| Language | JPN |
| Title (in Japanese) | (See Japanese page) |
| Sub Title (in Japanese) | (See Japanese page) |
| Title (in English) | High Rate Deposition of ITO thin Films by Facing Target Sputtering at Low Substrate Tempreature |
| Sub Title (in English) | |
| Keyword(1) | Facing target sputtering |
| Keyword(2) | ITO |
| Keyword(3) | transparent conductive thin films |
| Keyword(4) | high rate deposition |
| Keyword(5) | low temperature deposition |
| 1st Author's Name | Yoichi HOSHI |
| 1st Author's Affiliation | Faculty of Engineering, Tokyo Institute of Polytechnics() |
| 2nd Author's Name | Hiroomi KATO |
| 2nd Author's Affiliation | Faculty of Engineering, Tokyo Institute of Polytechnics |
| Date | 2002/8/2 |
| Paper # | CPM2002-61 |
| Volume (vol) | vol.102 |
| Number (no) | 261 |
| Page | pp.pp.- |
| #Pages | 4 |
| Date of Issue | |