Presentation 2005/12/14
Dose Optimization of Lateral SiC MOSFETs with Multi-RESURF Structure
Masato NOBORIO, Jun SUDA, Tsunenobu KIMOTO,
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Abstract(in English) Dose designing for SiC RESURF MOSFETs have been investigated by device simulation and fabrication. The simulated MOSFETs, which are called double RESURF MOSFETs, have the low-doped n-type region near drain region (RESURF region) and the buried-p region inside the RESURF region. Since the RESURF region is depleted not only from the RESURF/p-epilayer interface but from the RESURF/buried-p interface, a higher RESURF dose can be employed than normal RESURF MOSFETs, leading to a lower on-resistance. The doses for double RESURF MOSFETs are optimized by device simulation. From the simulation results, the breakdown voltage was mainly determined by neither the RESURF dose nor buried-p dose itself but by the net RESURF dose. The authors have fabricated SiC double RESURF MOSFETs with the optimum dose. The fabricated double RESURF MOSFET exhibits a low on-resistance of 52mΩcm^2 and a high breakdown voltage of 750V.
Keyword(in Japanese) (See Japanese page)
Keyword(in English) SiC / MOSFET / RESURF / device simulation / power device
Paper # SDM2005-223
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Conference Information
Committee SDM
Conference Date 2005/12/14(1days)
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Registration To Silicon Device and Materials (SDM)
Language JPN
Title (in Japanese) (See Japanese page)
Sub Title (in Japanese) (See Japanese page)
Title (in English) Dose Optimization of Lateral SiC MOSFETs with Multi-RESURF Structure
Sub Title (in English)
Keyword(1) SiC
Keyword(2) MOSFET
Keyword(3) RESURF
Keyword(4) device simulation
Keyword(5) power device
1st Author's Name Masato NOBORIO
1st Author's Affiliation Department of Electronic Science and Engineering, Kyoto University()
2nd Author's Name Jun SUDA
2nd Author's Affiliation Department of Electronic Science and Engineering, Kyoto University
3rd Author's Name Tsunenobu KIMOTO
3rd Author's Affiliation Department of Electronic Science and Engineering, Kyoto University
Date 2005/12/14
Paper # SDM2005-223
Volume (vol) vol.105
Number (no) 492
Page pp.pp.-
#Pages 6
Date of Issue