| Presentation | 2005/12/14 45nm-node lithography by using Mask Enhancer Tadami SHIMIZU, Takashi YUITO, Shigeo IRIE, Akio MISAKA, Shinji KISHIMURA, Hisashi WATANABE, Masayuki ENDO, Masaru SASAGO, |
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| PDF Download Page | PDF download Page Link |
| Abstract(in Japanese) | (See Japanese page) |
| Abstract(in English) | Immersion lithography as next generation lithography becomes one of the most extraordinary candidates for 45nm-node production and below. As RET(Resolution Enhancement Technology), we have proposed the new phase shifting mask, named "Mask Enhancer"(ME). It is demonstrated that immersion lithography with ME is innovative solutions for 45nm-node system LSIs fabrication. |
| Keyword(in Japanese) | (See Japanese page) |
| Keyword(in English) | Mask Enhancer / 45nm / Immersion / ArF / Lithography |
| Paper # | SDM2005-221 |
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| Conference Information | |
| Committee | SDM |
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| Conference Date | 2005/12/14(1days) |
| Place (in Japanese) | (See Japanese page) |
| Place (in English) | |
| Topics (in Japanese) | (See Japanese page) |
| Topics (in English) | |
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| Vice Chair | |
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| Paper Information | |
| Registration To | Silicon Device and Materials (SDM) |
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| Language | JPN |
| Title (in Japanese) | (See Japanese page) |
| Sub Title (in Japanese) | (See Japanese page) |
| Title (in English) | 45nm-node lithography by using Mask Enhancer |
| Sub Title (in English) | |
| Keyword(1) | Mask Enhancer |
| Keyword(2) | 45nm |
| Keyword(3) | Immersion |
| Keyword(4) | ArF |
| Keyword(5) | Lithography |
| 1st Author's Name | Tadami SHIMIZU |
| 1st Author's Affiliation | ULSI Process Technology Development Center, Semiconductor Company, Matsushita Electric Industrial Co., Ltd.() |
| 2nd Author's Name | Takashi YUITO |
| 2nd Author's Affiliation | ULSI Process Technology Development Center, Semiconductor Company, Matsushita Electric Industrial Co., Ltd. |
| 3rd Author's Name | Shigeo IRIE |
| 3rd Author's Affiliation | ULSI Process Technology Development Center, Semiconductor Company, Matsushita Electric Industrial Co., Ltd. |
| 4th Author's Name | Akio MISAKA |
| 4th Author's Affiliation | ULSI Process Technology Development Center, Semiconductor Company, Matsushita Electric Industrial Co., Ltd. |
| 5th Author's Name | Shinji KISHIMURA |
| 5th Author's Affiliation | ULSI Process Technology Development Center, Semiconductor Company, Matsushita Electric Industrial Co., Ltd. |
| 6th Author's Name | Hisashi WATANABE |
| 6th Author's Affiliation | ULSI Process Technology Development Center, Semiconductor Company, Matsushita Electric Industrial Co., Ltd. |
| 7th Author's Name | Masayuki ENDO |
| 7th Author's Affiliation | ULSI Process Technology Development Center, Semiconductor Company, Matsushita Electric Industrial Co., Ltd. |
| 8th Author's Name | Masaru SASAGO |
| 8th Author's Affiliation | ULSI Process Technology Development Center, Semiconductor Company, Matsushita Electric Industrial Co., Ltd. |
| Date | 2005/12/14 |
| Paper # | SDM2005-221 |
| Volume (vol) | vol.105 |
| Number (no) | 492 |
| Page | pp.pp.- |
| #Pages | 5 |
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