| Presentation | 1999/9/28 Prevention of native oxide growth by storage of silicon wafers in a closed pod and its application to the wafer transport before film depositon Koichiro Saga, Hitoshi Kuniyasu, Takeshi Hattori, |
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| PDF Download Page | PDF download Page Link |
| Abstract(in Japanese) | (See Japanese page) |
| Abstract(in English) | We have developed a mini-environment consisting of a nitrogen-purged wafer-transfer unit and a hermetically sealed aluminum pod which was used for the wafer transport from the wafer-cleaning equipment to film deposition equipments prior to film deposition steps in the process of the cobalt-silicide formation and the hemispherical-grain (HSG) poly-crystalline-silicon formation. As a result, the increase in sheet resistance of cobalt silicide and the decrease in the storage capacitance of electrode using HSG has been successfully prevented by inhibiting the growth of the native oxide on arsenic- or phosphorus-doped silicon surfaces. |
| Keyword(in Japanese) | (See Japanese page) |
| Keyword(in English) | Mini-Environment / Closed Pod / Nitrogen / Native Oxide / CoSi_2 / HSG |
| Paper # | SDM99-152 |
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| Conference Information | |
| Committee | SDM |
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| Conference Date | 1999/9/28(1days) |
| Place (in Japanese) | (See Japanese page) |
| Place (in English) | |
| Topics (in Japanese) | (See Japanese page) |
| Topics (in English) | |
| Chair | |
| Vice Chair | |
| Secretary | |
| Assistant | |
| Paper Information | |
| Registration To | Silicon Device and Materials (SDM) |
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| Language | JPN |
| Title (in Japanese) | (See Japanese page) |
| Sub Title (in Japanese) | (See Japanese page) |
| Title (in English) | Prevention of native oxide growth by storage of silicon wafers in a closed pod and its application to the wafer transport before film depositon |
| Sub Title (in English) | |
| Keyword(1) | Mini-Environment |
| Keyword(2) | Closed Pod |
| Keyword(3) | Nitrogen |
| Keyword(4) | Native Oxide |
| Keyword(5) | CoSi_2 |
| Keyword(6) | HSG |
| 1st Author's Name | Koichiro Saga |
| 1st Author's Affiliation | ULSI R&D Laboratories, Sony Corporation() |
| 2nd Author's Name | Hitoshi Kuniyasu |
| 2nd Author's Affiliation | ULSI R&D Laboratories, Sony Corporation |
| 3rd Author's Name | Takeshi Hattori |
| 3rd Author's Affiliation | ULSI R&D Laboratories, Sony Corporation |
| Date | 1999/9/28 |
| Paper # | SDM99-152 |
| Volume (vol) | vol.99 |
| Number (no) | 340 |
| Page | pp.pp.- |
| #Pages | 6 |
| Date of Issue | |