| Presentation | 1999/9/28 Tight-binding Molecular Dynamics Simulation on Silicon Plasma Oxidation Hitoshi Kurokawa, Aruba Yamada, Akira Endou, Seiichi Takami, Momoji Kubo, Akira Miyamoto, |
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| PDF Download Page | PDF download Page Link |
| Abstract(in Japanese) | (See Japanese page) |
| Abstract(in English) | According to the recently fabricated silicon device technology, the thickness of gate oxide has become only a few nanometers, So the effect of device characteristics resulted from the flatness of SiO_2/Si interface and the bonding state of the transition region can not be neglected. Recently total low-temperature process is taken into account in order to avoid mechanical stress caused by thermal-expansion-coefficient difference of Si, SiO_2 and interconnected metals. Plasma oxidation is a technique being used for growth insulator films on semiconductor surfaces at lower temperature than that used for thermal oxidation. In this study, we performed plasma oxidation simulation using tight-binding molecular dynamics, the oxygen species are emitted over the substrate and the structure of constructed SiO_2 film was discussed. |
| Keyword(in Japanese) | (See Japanese page) |
| Keyword(in English) | Tight-binding molecular dynamics / silicon / plasma oxidation |
| Paper # | SDM99-150 |
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| Conference Information | |
| Committee | SDM |
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| Conference Date | 1999/9/28(1days) |
| Place (in Japanese) | (See Japanese page) |
| Place (in English) | |
| Topics (in Japanese) | (See Japanese page) |
| Topics (in English) | |
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| Vice Chair | |
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| Paper Information | |
| Registration To | Silicon Device and Materials (SDM) |
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| Language | JPN |
| Title (in Japanese) | (See Japanese page) |
| Sub Title (in Japanese) | (See Japanese page) |
| Title (in English) | Tight-binding Molecular Dynamics Simulation on Silicon Plasma Oxidation |
| Sub Title (in English) | |
| Keyword(1) | Tight-binding molecular dynamics |
| Keyword(2) | silicon |
| Keyword(3) | plasma oxidation |
| 1st Author's Name | Hitoshi Kurokawa |
| 1st Author's Affiliation | Graduate School of Engineering, Tohoku University() |
| 2nd Author's Name | Aruba Yamada |
| 2nd Author's Affiliation | Graduate School of Engineering, Tohoku University |
| 3rd Author's Name | Akira Endou |
| 3rd Author's Affiliation | Graduate School of Engineering, Tohoku University |
| 4th Author's Name | Seiichi Takami |
| 4th Author's Affiliation | Graduate School of Engineering, Tohoku University |
| 5th Author's Name | Momoji Kubo |
| 5th Author's Affiliation | Graduate School of Engineering, Tohoku University |
| 6th Author's Name | Akira Miyamoto |
| 6th Author's Affiliation | Graduate School of Engineering, Tohoku University |
| Date | 1999/9/28 |
| Paper # | SDM99-150 |
| Volume (vol) | vol.99 |
| Number (no) | 340 |
| Page | pp.pp.- |
| #Pages | 6 |
| Date of Issue | |