Presentation | 1999/9/27 Infrared observation of etching process of silicon surface controlling electrode potential Yasuo Kimura, Yusuke Kondoh, Michio Niwano, |
---|---|
PDF Download Page | PDF download Page Link |
Abstract(in Japanese) | (See Japanese page) |
Abstract(in English) | We in-situ investigated etching process of silicon surface applied potential in hydrofluoric acid using infrared spectroscopy in the multiple internal reflection geometry. When low potential was applied, silicon surface was terminated by hydride species and the electrode potential drastically enhanced the etching reaction. At the initial stages of etching, monohydride species was favored and step cites generated but with increase of etching duration dihydride species increased, porous silicon formation took place and the surface of porous silicon was terminated by hydride species. However, hydride species decreased and disappeared when electrode potential was more than about 1V. |
Keyword(in Japanese) | (See Japanese page) |
Keyword(in English) | porous silicon / etching / electrochemistry / infrared spectroscopy |
Paper # | SDM99-143 |
Date of Issue |
Conference Information | |
Committee | SDM |
---|---|
Conference Date | 1999/9/27(1days) |
Place (in Japanese) | (See Japanese page) |
Place (in English) | |
Topics (in Japanese) | (See Japanese page) |
Topics (in English) | |
Chair | |
Vice Chair | |
Secretary | |
Assistant |
Paper Information | |
Registration To | Silicon Device and Materials (SDM) |
---|---|
Language | JPN |
Title (in Japanese) | (See Japanese page) |
Sub Title (in Japanese) | (See Japanese page) |
Title (in English) | Infrared observation of etching process of silicon surface controlling electrode potential |
Sub Title (in English) | |
Keyword(1) | porous silicon |
Keyword(2) | etching |
Keyword(3) | electrochemistry |
Keyword(4) | infrared spectroscopy |
1st Author's Name | Yasuo Kimura |
1st Author's Affiliation | Research Institute of Electrical Communication, Tohoku University() |
2nd Author's Name | Yusuke Kondoh |
2nd Author's Affiliation | Research Institute of Electrical Communication, Tohoku University |
3rd Author's Name | Michio Niwano |
3rd Author's Affiliation | Research Institute of Electrical Communication, Tohoku University |
Date | 1999/9/27 |
Paper # | SDM99-143 |
Volume (vol) | vol.99 |
Number (no) | 339 |
Page | pp.pp.- |
#Pages | 5 |
Date of Issue |