Presentation | 1999/11/18 Self-heating Effect Compensation in HBTs and Its Analysis Y. Zhu, J. K. Twynam, M. Yagura, M. Hasegawa, T. Hasegawa, Y. Eguchi, Y. Amano, E. Suematsu, K. Sakuno, N. Matsumoto, H. Sato, N. Hashizume, |
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Abstract(in Japanese) | (See Japanese page) |
Abstract(in English) | A simple technique, inserting a specified resistance in the bias circuit, to compensate self-heating effect in DC and pulse characteristics of HBTs is proposed and demonstrated. Utilizing the bias scheme dependence of HBT behaviors, the compensation is achieved due to the cancellation of the positive and negative thermal-electric feedback inside HBTs. An analytical expression relating the specified resistance with the physical parameters of HBT is presented |
Keyword(in Japanese) | (See Japanese page) |
Keyword(in English) | HBT / self-heating / compensation / feedback / bias circuit |
Paper # | MW99-149 |
Date of Issue |
Conference Information | |
Committee | MW |
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Conference Date | 1999/11/18(1days) |
Place (in Japanese) | (See Japanese page) |
Place (in English) | |
Topics (in Japanese) | (See Japanese page) |
Topics (in English) | |
Chair | |
Vice Chair | |
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Paper Information | |
Registration To | Microwaves (MW) |
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Language | ENG |
Title (in Japanese) | (See Japanese page) |
Sub Title (in Japanese) | (See Japanese page) |
Title (in English) | Self-heating Effect Compensation in HBTs and Its Analysis |
Sub Title (in English) | |
Keyword(1) | HBT |
Keyword(2) | self-heating |
Keyword(3) | compensation |
Keyword(4) | feedback |
Keyword(5) | bias circuit |
1st Author's Name | Y. Zhu |
1st Author's Affiliation | Advanced Technology Laboratories, SHARP Corporation() |
2nd Author's Name | J. K. Twynam |
2nd Author's Affiliation | Advanced Technology Laboratories, SHARP Corporation |
3rd Author's Name | M. Yagura |
3rd Author's Affiliation | Advanced Technology Laboratories, SHARP Corporation |
4th Author's Name | M. Hasegawa |
4th Author's Affiliation | Advanced Technology Laboratories, SHARP Corporation |
5th Author's Name | T. Hasegawa |
5th Author's Affiliation | Advanced Technology Laboratories, SHARP Corporation |
6th Author's Name | Y. Eguchi |
6th Author's Affiliation | Advanced Technology Laboratories, SHARP Corporation |
7th Author's Name | Y. Amano |
7th Author's Affiliation | Advanced Technology Laboratories, SHARP Corporation |
8th Author's Name | E. Suematsu |
8th Author's Affiliation | Advanced Technology Laboratories, SHARP Corporation |
9th Author's Name | K. Sakuno |
9th Author's Affiliation | Advanced Technology Laboratories, SHARP Corporation |
10th Author's Name | N. Matsumoto |
10th Author's Affiliation | Advanced Technology Laboratories, SHARP Corporation |
11th Author's Name | H. Sato |
11th Author's Affiliation | Advanced Technology Laboratories, SHARP Corporation |
12th Author's Name | N. Hashizume |
12th Author's Affiliation | Advanced Technology Laboratories, SHARP Corporation |
Date | 1999/11/18 |
Paper # | MW99-149 |
Volume (vol) | vol.99 |
Number (no) | 442 |
Page | pp.pp.- |
#Pages | 6 |
Date of Issue |