| Presentation | 1999/12/13 Electron Beam Stepper for Next Generation Lithography Kazuya Okamoto, Kazuaki Suzuki, Teruaki Okino, Shintaro Kawata, Kenji Morita, Kazunari Hada, Kiyoshi Uchikawa, Akikazu Tanimoto, Takeshi Yamaguchi, |
|---|---|
| PDF Download Page | PDF download Page Link |
| Abstract(in Japanese) | (See Japanese page) |
| Abstract(in English) | Nikon Corporation, in collaboration with IBM, has successfully demonstrated feasibility of an electron optical system for Electron Beam (EB) steppers, which allows for extremely high prodrctivity LSI manufacture of sub-100nm minimum feature size. Consistent with a sub-100nm design rule predicted to be in production on a full scale in 2005, the proposed system will be capable of priniting high performance MPUs and 16G DRAMs, which have approximately 250 times more memory capacity than currently with the mainstream 64M DRAMs, with throughput of forty or more 200 mm wafers per hour (about twenty 300 mm wafers). What differentiates this system from "direct-write method" electron-beam exposure systems is that circuit patterns are demagnified and projected onto a wafer from a mask while being scanned in the same fashion as optical scanning steppers, which are currently in use for IC manufacturing process. |
| Keyword(in Japanese) | (See Japanese page) |
| Keyword(in English) | Lithography / Electron Beam (E-beam) / Electron Optics / Projection / E-beam Resist / Stencil Reticle |
| Paper # | ED99-246 |
| Date of Issue |
| Conference Information | |
| Committee | ED |
|---|---|
| Conference Date | 1999/12/13(1days) |
| Place (in Japanese) | (See Japanese page) |
| Place (in English) | |
| Topics (in Japanese) | (See Japanese page) |
| Topics (in English) | |
| Chair | |
| Vice Chair | |
| Secretary | |
| Assistant | |
| Paper Information | |
| Registration To | Electron Devices (ED) |
|---|---|
| Language | JPN |
| Title (in Japanese) | (See Japanese page) |
| Sub Title (in Japanese) | (See Japanese page) |
| Title (in English) | Electron Beam Stepper for Next Generation Lithography |
| Sub Title (in English) | |
| Keyword(1) | Lithography |
| Keyword(2) | Electron Beam (E-beam) |
| Keyword(3) | Electron Optics |
| Keyword(4) | Projection |
| Keyword(5) | E-beam Resist |
| Keyword(6) | Stencil Reticle |
| 1st Author's Name | Kazuya Okamoto |
| 1st Author's Affiliation | Nikon Corporation() |
| 2nd Author's Name | Kazuaki Suzuki |
| 2nd Author's Affiliation | Nikon Corporation |
| 3rd Author's Name | Teruaki Okino |
| 3rd Author's Affiliation | Nikon Corporation |
| 4th Author's Name | Shintaro Kawata |
| 4th Author's Affiliation | Nikon Corporation |
| 5th Author's Name | Kenji Morita |
| 5th Author's Affiliation | Nikon Corporation |
| 6th Author's Name | Kazunari Hada |
| 6th Author's Affiliation | Nikon Corporation |
| 7th Author's Name | Kiyoshi Uchikawa |
| 7th Author's Affiliation | Nikon Corporation |
| 8th Author's Name | Akikazu Tanimoto |
| 8th Author's Affiliation | Nikon Corporation |
| 9th Author's Name | Takeshi Yamaguchi |
| 9th Author's Affiliation | Nikon Corporation |
| Date | 1999/12/13 |
| Paper # | ED99-246 |
| Volume (vol) | vol.99 |
| Number (no) | 497 |
| Page | pp.pp.- |
| #Pages | 8 |
| Date of Issue | |