Presentation 1999/10/22
Optical Recombination Processes in InGaN Quantum Wells on FIELO-GaN Substrates
A. Atsushi Yamaguchi, Yasunori Mochizuki, Masashi Mizuta,
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Abstract(in English) We have investigated the recombination mechanism in FIELO-GaN and InGaN quantum wells (QWs) on FIELO substrates by time-resolved and temperature-dependent photoluminescence measurements. It is found that the nonradiative defect densities in FIELO-GaN films are much smaller than those in MOVPE-GaN films on sapphire substrates. It is also found, for InGaN-QW, the emission efficiency is determined by not only the defect density but the compositional fluctuation. We have proposed a model to evaluate separately these two factors from the optical measurements. From this analysis, it is shown that both the defect density and the fluctuation are largely reduced in QW on FIELO substrates.
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Keyword(in English) FIELO / GaN / InGaN quantum well / nonradiative center / dislocation / compositional fluctuation
Paper # CPM99-111
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Committee CPM
Conference Date 1999/10/22(1days)
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Language JPN
Title (in Japanese) (See Japanese page)
Sub Title (in Japanese) (See Japanese page)
Title (in English) Optical Recombination Processes in InGaN Quantum Wells on FIELO-GaN Substrates
Sub Title (in English)
Keyword(1) FIELO
Keyword(2) GaN
Keyword(3) InGaN quantum well
Keyword(4) nonradiative center
Keyword(5) dislocation
Keyword(6) compositional fluctuation
1st Author's Name A. Atsushi Yamaguchi
1st Author's Affiliation Fundamental Research Laboratories, NEC Corporation()
2nd Author's Name Yasunori Mochizuki
2nd Author's Affiliation Fundamental Research Laboratories, NEC Corporation
3rd Author's Name Masashi Mizuta
3rd Author's Affiliation Optoelectronics and High Frequency Device Research Laboratories, NEC Corporation
Date 1999/10/22
Paper # CPM99-111
Volume (vol) vol.99
Number (no) 379
Page pp.pp.-
#Pages 6
Date of Issue