Presentation 1999/10/21
Deep level observation in 3C-SiC grown on Si using HMDS
M. Kato, M. Ichimura, E. Arai, Y. Masuda, Y. Chen, S. Nishino,
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Abstract(in English) n-type 3C-SiC was heteroepitaxially grown on n-type Si(100) substrates using HMDS (Hexamethyldisilane). In order to investigate relation of electronic defects with epilayer thickness, epilayers with various thickness were grown. Then we carried out DLTS measurement. As a result of their measurements, relatively thin epilayers showed many defects having activation energies distributed in a wide range, and relatively thick epilayers showed a defect having activation energy of 0.25eV. This defect level is slightly shallower than that in 3C-SiC grown by SiH_4 and C_3H_8.
Keyword(in Japanese) (See Japanese page)
Keyword(in English) HMDS / 3C-SiC / DLTS / epilayer thickness / electronic defect
Paper # CPM99-106
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Committee CPM
Conference Date 1999/10/21(1days)
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Registration To Component Parts and Materials (CPM)
Language JPN
Title (in Japanese) (See Japanese page)
Sub Title (in Japanese) (See Japanese page)
Title (in English) Deep level observation in 3C-SiC grown on Si using HMDS
Sub Title (in English)
Keyword(1) HMDS
Keyword(2) 3C-SiC
Keyword(3) DLTS
Keyword(4) epilayer thickness
Keyword(5) electronic defect
1st Author's Name M. Kato
1st Author's Affiliation Nagoya Inst. Tech.()
2nd Author's Name M. Ichimura
2nd Author's Affiliation Nagoya Inst. Tech.
3rd Author's Name E. Arai
3rd Author's Affiliation Nagoya Inst. Tech.
4th Author's Name Y. Masuda
4th Author's Affiliation Kyoto Inst. Tech.
5th Author's Name Y. Chen
5th Author's Affiliation Kyoto Inst. Tech.
6th Author's Name S. Nishino
6th Author's Affiliation Kyoto Inst. Tech.
Date 1999/10/21
Paper # CPM99-106
Volume (vol) vol.99
Number (no) 378
Page pp.pp.-
#Pages 6
Date of Issue