Presentation | 1999/10/15 Epitaxial Growth of AlN Films by ECR Plasma Enhanced MOCVD Suguru HOSHINO, Yuzuru NARITA, Kanji YASUI, Masashi Akahane, |
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Abstract(in Japanese) | (See Japanese page) |
Abstract(in English) | Hexagonal AlN films were epitaxially grown on (0001) sapphire substrate by electron-cyclotron-resonance plasma enhanced metalorganic chemical vapor deposition (ECRMOCVD) using trimethylalminum (TMA) and ammonia (NH_3) as source gases. We investigated the influences of the initial treatments of sapphire substrates, such as initial nitridation and the deposition of low-temperature AlN buffer layer (LT-AlN layer), upon the surface morphology and the crystallinity of epitaxial films. It was found that LT-AlN layer deposited at temperatures around 600℃ and nitridation improved the crystallinity and the crystal orientation of AlN films. Furthermore, AlN films grown after thermal nitridation showed more excellent surface morphology than those grown after plasma nitridation. |
Keyword(in Japanese) | (See Japanese page) |
Keyword(in English) | AlN / epitaxial growth / ECR plasma / MOCVD / nitridation / buffer layer |
Paper # | CPM99-87 |
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Committee | CPM |
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Conference Date | 1999/10/15(1days) |
Place (in Japanese) | (See Japanese page) |
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Paper Information | |
Registration To | Component Parts and Materials (CPM) |
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Language | JPN |
Title (in Japanese) | (See Japanese page) |
Sub Title (in Japanese) | (See Japanese page) |
Title (in English) | Epitaxial Growth of AlN Films by ECR Plasma Enhanced MOCVD |
Sub Title (in English) | |
Keyword(1) | AlN |
Keyword(2) | epitaxial growth |
Keyword(3) | ECR plasma |
Keyword(4) | MOCVD |
Keyword(5) | nitridation |
Keyword(6) | buffer layer |
1st Author's Name | Suguru HOSHINO |
1st Author's Affiliation | Department of Electrical Engineering, Nagaoka University of Technology() |
2nd Author's Name | Yuzuru NARITA |
2nd Author's Affiliation | Department of Electrical Engineering, Nagaoka University of Technology |
3rd Author's Name | Kanji YASUI |
3rd Author's Affiliation | Department of Electrical Engineering, Nagaoka University of Technology |
4th Author's Name | Masashi Akahane |
4th Author's Affiliation | Department of Electrical Engineering, Nagaoka University of Technology |
Date | 1999/10/15 |
Paper # | CPM99-87 |
Volume (vol) | vol.99 |
Number (no) | 361 |
Page | pp.pp.- |
#Pages | 6 |
Date of Issue |