Presentation 1999/10/15
Epitaxial Growth of AlN Films by ECR Plasma Enhanced MOCVD
Suguru HOSHINO, Yuzuru NARITA, Kanji YASUI, Masashi Akahane,
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Abstract(in English) Hexagonal AlN films were epitaxially grown on (0001) sapphire substrate by electron-cyclotron-resonance plasma enhanced metalorganic chemical vapor deposition (ECRMOCVD) using trimethylalminum (TMA) and ammonia (NH_3) as source gases. We investigated the influences of the initial treatments of sapphire substrates, such as initial nitridation and the deposition of low-temperature AlN buffer layer (LT-AlN layer), upon the surface morphology and the crystallinity of epitaxial films. It was found that LT-AlN layer deposited at temperatures around 600℃ and nitridation improved the crystallinity and the crystal orientation of AlN films. Furthermore, AlN films grown after thermal nitridation showed more excellent surface morphology than those grown after plasma nitridation.
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Keyword(in English) AlN / epitaxial growth / ECR plasma / MOCVD / nitridation / buffer layer
Paper # CPM99-87
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Committee CPM
Conference Date 1999/10/15(1days)
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Language JPN
Title (in Japanese) (See Japanese page)
Sub Title (in Japanese) (See Japanese page)
Title (in English) Epitaxial Growth of AlN Films by ECR Plasma Enhanced MOCVD
Sub Title (in English)
Keyword(1) AlN
Keyword(2) epitaxial growth
Keyword(3) ECR plasma
Keyword(4) MOCVD
Keyword(5) nitridation
Keyword(6) buffer layer
1st Author's Name Suguru HOSHINO
1st Author's Affiliation Department of Electrical Engineering, Nagaoka University of Technology()
2nd Author's Name Yuzuru NARITA
2nd Author's Affiliation Department of Electrical Engineering, Nagaoka University of Technology
3rd Author's Name Kanji YASUI
3rd Author's Affiliation Department of Electrical Engineering, Nagaoka University of Technology
4th Author's Name Masashi Akahane
4th Author's Affiliation Department of Electrical Engineering, Nagaoka University of Technology
Date 1999/10/15
Paper # CPM99-87
Volume (vol) vol.99
Number (no) 361
Page pp.pp.-
#Pages 6
Date of Issue