Presentation 2000/2/10
Novel STM probe assisted site-control of quantum dots with nanometer precision
Hitoshi Nakamura, Shigeru Kohmoto, Tomonori Ishikawa, Kiyoshi Asakawa,
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Abstract(in English) We propose a novel site-control technique for strained quantum dots(QDs)based on nano-lithography using an STM integrated into a UHV STM / MBE multi-chamber system. A nano-scale deposit was formed on a GaAs surface by applying voltage between the GaAs surface and the tungsten tip of the STM. Since the deposit acted as a nono-mask, the subsequent GaAs growth formed a nono-hole just above the deposit. Subsequent InAs supply produced a QD on the hole site, and no QD was observed in any undesirable regions. We also observed the QD formation processes involved in the technique, based on step-by-step STM observations of the QD formation process. The observation directly revealed an InAs wetting layer formation with 1-ML thickness on the GaAs terraces followed by the QD formation in the Stranski-Krastanow growth mode.
Keyword(in Japanese) (See Japanese page)
Keyword(in English) quantum dots / site-control / scanning tunneling microscope / InAs/GaAs / wetting layer / Stranski-Krastanow growth mode
Paper # ED99-313, SDM99-206
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Committee ED
Conference Date 2000/2/10(1days)
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Registration To Electron Devices (ED)
Language JPN
Title (in Japanese) (See Japanese page)
Sub Title (in Japanese) (See Japanese page)
Title (in English) Novel STM probe assisted site-control of quantum dots with nanometer precision
Sub Title (in English)
Keyword(1) quantum dots
Keyword(2) site-control
Keyword(3) scanning tunneling microscope
Keyword(4) InAs/GaAs
Keyword(5) wetting layer
Keyword(6) Stranski-Krastanow growth mode
1st Author's Name Hitoshi Nakamura
1st Author's Affiliation The Femtosecond Technology Research Association(FESTA)()
2nd Author's Name Shigeru Kohmoto
2nd Author's Affiliation The Femtosecond Technology Research Association(FESTA)
3rd Author's Name Tomonori Ishikawa
3rd Author's Affiliation The Femtosecond Technology Research Association(FESTA)
4th Author's Name Kiyoshi Asakawa
4th Author's Affiliation The Femtosecond Technology Research Association(FESTA)
Date 2000/2/10
Paper # ED99-313, SDM99-206
Volume (vol) vol.99
Number (no) 616
Page pp.pp.-
#Pages 8
Date of Issue