Presentation | 2000/2/10 Novel STM probe assisted site-control of quantum dots with nanometer precision Hitoshi Nakamura, Shigeru Kohmoto, Tomonori Ishikawa, Kiyoshi Asakawa, |
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Abstract(in Japanese) | (See Japanese page) |
Abstract(in English) | We propose a novel site-control technique for strained quantum dots(QDs)based on nano-lithography using an STM integrated into a UHV STM / MBE multi-chamber system. A nano-scale deposit was formed on a GaAs surface by applying voltage between the GaAs surface and the tungsten tip of the STM. Since the deposit acted as a nono-mask, the subsequent GaAs growth formed a nono-hole just above the deposit. Subsequent InAs supply produced a QD on the hole site, and no QD was observed in any undesirable regions. We also observed the QD formation processes involved in the technique, based on step-by-step STM observations of the QD formation process. The observation directly revealed an InAs wetting layer formation with 1-ML thickness on the GaAs terraces followed by the QD formation in the Stranski-Krastanow growth mode. |
Keyword(in Japanese) | (See Japanese page) |
Keyword(in English) | quantum dots / site-control / scanning tunneling microscope / InAs/GaAs / wetting layer / Stranski-Krastanow growth mode |
Paper # | ED99-313, SDM99-206 |
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Conference Information | |
Committee | ED |
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Conference Date | 2000/2/10(1days) |
Place (in Japanese) | (See Japanese page) |
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Topics (in Japanese) | (See Japanese page) |
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Paper Information | |
Registration To | Electron Devices (ED) |
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Language | JPN |
Title (in Japanese) | (See Japanese page) |
Sub Title (in Japanese) | (See Japanese page) |
Title (in English) | Novel STM probe assisted site-control of quantum dots with nanometer precision |
Sub Title (in English) | |
Keyword(1) | quantum dots |
Keyword(2) | site-control |
Keyword(3) | scanning tunneling microscope |
Keyword(4) | InAs/GaAs |
Keyword(5) | wetting layer |
Keyword(6) | Stranski-Krastanow growth mode |
1st Author's Name | Hitoshi Nakamura |
1st Author's Affiliation | The Femtosecond Technology Research Association(FESTA)() |
2nd Author's Name | Shigeru Kohmoto |
2nd Author's Affiliation | The Femtosecond Technology Research Association(FESTA) |
3rd Author's Name | Tomonori Ishikawa |
3rd Author's Affiliation | The Femtosecond Technology Research Association(FESTA) |
4th Author's Name | Kiyoshi Asakawa |
4th Author's Affiliation | The Femtosecond Technology Research Association(FESTA) |
Date | 2000/2/10 |
Paper # | ED99-313, SDM99-206 |
Volume (vol) | vol.99 |
Number (no) | 616 |
Page | pp.pp.- |
#Pages | 8 |
Date of Issue |