Presentation 2000/2/9
Carrier Transport in Ultrasmall MOSFETs
Hisao Kawaura, Toshitsugu Sakamoto, Toshio Baba,
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Abstract(in English) We have characterized carrier transport in MOSFETs below the deca-nanometer scale using ultrasmall test-devices based on 10-nm-level lithography.We directly detected hot electrons that run across the channel without sufficient energy-relaxation, and estimated the relaxation-length to be around 25 nm.At the channel length below 10 nm electrons in the source directly tunneled to the drain, causing the degradation of the subthreshold swing.We also showed that the direct tunneling current will exceed the thermal current and will become detrimental to low-voltage / power operation of logic LSIs below 5-nm generations.
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Keyword(in English) silicon / hot electron / tunneling / subthreshold swing
Paper # ED99-300,SDM99-193
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Committee ED
Conference Date 2000/2/9(1days)
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Registration To Electron Devices (ED)
Language JPN
Title (in Japanese) (See Japanese page)
Sub Title (in Japanese) (See Japanese page)
Title (in English) Carrier Transport in Ultrasmall MOSFETs
Sub Title (in English)
Keyword(1) silicon
Keyword(2) hot electron
Keyword(3) tunneling
Keyword(4) subthreshold swing
1st Author's Name Hisao Kawaura
1st Author's Affiliation Fundamental Research Labs., NEC Corporation()
2nd Author's Name Toshitsugu Sakamoto
2nd Author's Affiliation Fundamental Research Labs., NEC Corporation
3rd Author's Name Toshio Baba
3rd Author's Affiliation Fundamental Research Labs., NEC Corporation
Date 2000/2/9
Paper # ED99-300,SDM99-193
Volume (vol) vol.99
Number (no) 615
Page pp.pp.-
#Pages 8
Date of Issue