Presentation 2000/3/17
Threshold voltage shift in 0.1μm self-aligned-gate GaAs-MESFETs under bians stress and prediction of their life time
K. YOSHINO FUKAI, Kimiyoshi YAMASAKI, Kazumi NISHIMURA,
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Abstract(in English) Bias-temperature stress examinations of self-aligned 0.1μm-length gate GaAs-MESFETs have revealed a shift of threshold voltage related to Si doping concentration near the gate sides next to the channel region. With lowering doping concentration, the increase in threshold voltage in FETs goes faster and a 100-mV increase leads to a 20% reduction of operation speed in digital ICs after forward-biased storage at 200℃. The recovery of threshold voltage and the performance of digital ICs under reverse-biased stresses was observed. The degradation is released by increasing Si doping concentration as high as it can be set without causing serious reduction of breakdown voltage. We obtained the prediction of a median life exceeding 10^6 hours at 100℃ by setting the Si dose of 4.0 × 10^13 cm^-2.
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Keyword(in English) GaAs-MESFETs / self-aligned 0.1 μm-length gate / bias-temperature stress / threshold voltage / life time
Paper # R99-43,CPM99-166
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Committee CPM
Conference Date 2000/3/17(1days)
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Registration To Component Parts and Materials (CPM)
Language JPN
Title (in Japanese) (See Japanese page)
Sub Title (in Japanese) (See Japanese page)
Title (in English) Threshold voltage shift in 0.1μm self-aligned-gate GaAs-MESFETs under bians stress and prediction of their life time
Sub Title (in English)
Keyword(1) GaAs-MESFETs
Keyword(2) self-aligned 0.1 μm-length gate
Keyword(3) bias-temperature stress
Keyword(4) threshold voltage
Keyword(5) life time
1st Author's Name K. YOSHINO FUKAI
1st Author's Affiliation NTT Photonics Laboratories()
2nd Author's Name Kimiyoshi YAMASAKI
2nd Author's Affiliation NTT Electronics Corpration
3rd Author's Name Kazumi NISHIMURA
3rd Author's Affiliation NTT Electronics Corpration
Date 2000/3/17
Paper # R99-43,CPM99-166
Volume (vol) vol.99
Number (no) 712
Page pp.pp.-
#Pages 6
Date of Issue