Presentation 1997/8/4
Piezoresistance Effects in p-Type Si and Ge
Y Ohmura,
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Abstract(in Japanese) (See Japanese page)
Abstract(in English) The 1st- and 2nd-order piezoresistance coefficients which agree well with experimental ones have been obtained from conductivities calculated for p-type Si and Ge with and without stress, using the well-known sixfold valence band structure. The fractional mobility change for each hole is the same order of magnitude as piezoresistance, while the hole concentration change is several orders of magnitude smaller. These effects have been explained in terms of density-of-states changes near hole band edges.
Keyword(in Japanese) (See Japanese page)
Keyword(in English) piezoresistance effect / p-Si / p-Ge / valence band structure / strain sensor
Paper # CPM97-52
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Conference Information
Committee CPM
Conference Date 1997/8/4(1days)
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Registration To Component Parts and Materials (CPM)
Language JPN
Title (in Japanese) (See Japanese page)
Sub Title (in Japanese) (See Japanese page)
Title (in English) Piezoresistance Effects in p-Type Si and Ge
Sub Title (in English)
Keyword(1) piezoresistance effect
Keyword(2) p-Si
Keyword(3) p-Ge
Keyword(4) valence band structure
Keyword(5) strain sensor
1st Author's Name Y Ohmura
1st Author's Affiliation Dept. Electronic Engineering, Iwaki Meisei University()
Date 1997/8/4
Paper # CPM97-52
Volume (vol) vol.97
Number (no) 220
Page pp.pp.-
#Pages 6
Date of Issue