Presentation | 2005-09-21 Recognition Method of Minute Defect Based on Comparison to Statistical Pattern and Outlier Detection on Feature Space Kaoru SAKAI, Shunji MAEDA, |
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Abstract(in Japanese) | (See Japanese page) |
Abstract(in English) | Reductions of the noise caused by the pattern shape difference and the sampling errors are essential to recognize a minute defect on the complicated multilayer patterns on wafers. We propose a highly sensitive comparison inspection method with noise reducion. We generate a statistical pattern from plural repetitive patterns and we compare the detected image with the statistical pattern. The grayscale is converted so that the grayscales of the two images are matched and the difference is compressed using Maharanobis distance according to the grayscale fluctuation. This new method can detect small defects without the influence of pattern roughness. |
Keyword(in Japanese) | (See Japanese page) |
Keyword(in English) | Comparison inspection / Defect recognition / Statistical outlier detection |
Paper # | NLC2005-26,PRMU2005-53 |
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Committee | PRMU |
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Conference Date | 2005/9/14(1days) |
Place (in Japanese) | (See Japanese page) |
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Registration To | Pattern Recognition and Media Understanding (PRMU) |
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Language | JPN |
Title (in Japanese) | (See Japanese page) |
Sub Title (in Japanese) | (See Japanese page) |
Title (in English) | Recognition Method of Minute Defect Based on Comparison to Statistical Pattern and Outlier Detection on Feature Space |
Sub Title (in English) | |
Keyword(1) | Comparison inspection |
Keyword(2) | Defect recognition |
Keyword(3) | Statistical outlier detection |
1st Author's Name | Kaoru SAKAI |
1st Author's Affiliation | Hitachi, LTD., Production Engineering Research Laboratory() |
2nd Author's Name | Shunji MAEDA |
2nd Author's Affiliation | Hitachi, LTD., Production Engineering Research Laboratory |
Date | 2005-09-21 |
Paper # | NLC2005-26,PRMU2005-53 |
Volume (vol) | vol.105 |
Number (no) | 301 |
Page | pp.pp.- |
#Pages | 6 |
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