Presentation 2002/2/15
Crystal growth and characteristics of GaN-Based LEDs on Si substrates
N. Nishikawa, B. Zhang, H. Ishikawa, T. Egawa, T. Jimbo, M. Umeno,
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Abstract(in English) We report characteristics of InGaN multiple-quantum-well (MQW) green Light-emitting diodes (LEDs) on Si (111) substrates, The MQW LEDs were grown on Si by metalorganic chemical vapor deposition using Al_0.27Ga_0.73N/AlN intermediate layers. The LED on Si showed an operating voltage of 7V, a series resistance of 100Ω, an optical output power of 20mΩ, and a peak emission wavelength of 505 nm with a full width at half maximum of 33 nm at 20 mA drive current.
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Keyword(in English) MOCVD / Si 上 GaN / InGaN LED / MQW / AlGaN/AlN intermediate layer
Paper # LQE2001-142
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Committee LQE
Conference Date 2002/2/15(1days)
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Registration To Lasers and Quantum Electronics (LQE)
Language JPN
Title (in Japanese) (See Japanese page)
Sub Title (in Japanese) (See Japanese page)
Title (in English) Crystal growth and characteristics of GaN-Based LEDs on Si substrates
Sub Title (in English)
Keyword(1) MOCVD
Keyword(2) Si 上 GaN
Keyword(3) InGaN LED
Keyword(4) MQW
Keyword(5) AlGaN/AlN intermediate layer
1st Author's Name N. Nishikawa
1st Author's Affiliation Research Center for Micro-Structure Devices, Nagoya Institute of Technology()
2nd Author's Name B. Zhang
2nd Author's Affiliation Research Center for Micro-Structure Devices, Nagoya Institute of Technology
3rd Author's Name H. Ishikawa
3rd Author's Affiliation Research Center for Micro-Structure Devices, Nagoya Institute of Technology
4th Author's Name T. Egawa
4th Author's Affiliation Research Center for Micro-Structure Devices, Nagoya Institute of Technology
5th Author's Name T. Jimbo
5th Author's Affiliation Research Center for Micro-Structure Devices, Nagoya Institute of Technology
6th Author's Name M. Umeno
6th Author's Affiliation Dept. Electronic Engineering, Chubu Univ.
Date 2002/2/15
Paper # LQE2001-142
Volume (vol) vol.101
Number (no) 657
Page pp.pp.-
#Pages 6
Date of Issue