| Presentation | 2005-09-09 Measurement of Inner-chip Variation and Signal Integrity By a 90-nm Large-scale TEG Masaharu Yamamoto, Yayoi Hayasi, Hitoshi Endo, Hiroo Masuda, |
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| PDF Download Page |  PDF download Page Link |
| Abstract(in Japanese) | (See Japanese page) |
| Abstract(in English) | We have developed the world first measurement methodology of both inner chip variation and SI(signal integrity) in a same 90nm large scale TEG(Test Element Group). |
| Keyword(in Japanese) | (See Japanese page) |
| Keyword(in English) | Inner chip variation / Signal Integrity / 90nm / Large scale TEG |
| Paper # | CPM2005-103,ICD2005-113 |
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| Conference Information | |
| Committee | ICD |
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| Conference Date | 2005/9/2(1days) |
| Place (in Japanese) | (See Japanese page) |
| Place (in English) | |
| Topics (in Japanese) | (See Japanese page) |
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| Paper Information | |
| Registration To | Integrated Circuits and Devices (ICD) |
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| Language | ENG |
| Title (in Japanese) | (See Japanese page) |
| Sub Title (in Japanese) | (See Japanese page) |
| Title (in English) | Measurement of Inner-chip Variation and Signal Integrity By a 90-nm Large-scale TEG |
| Sub Title (in English) | |
| Keyword(1) | Inner chip variation |
| Keyword(2) | Signal Integrity |
| Keyword(3) | 90nm |
| Keyword(4) | Large scale TEG |
| 1st Author's Name | Masaharu Yamamoto |
| 1st Author's Affiliation | Semiconductor Technology Academic Research Center (STARC)() |
| 2nd Author's Name | Yayoi Hayasi |
| 2nd Author's Affiliation | Hitachi ULSI Systems Co., Ltd. |
| 3rd Author's Name | Hitoshi Endo |
| 3rd Author's Affiliation | Hitachi ULSI Systems Co., Ltd. |
| 4th Author's Name | Hiroo Masuda |
| 4th Author's Affiliation | Semiconductor Technology Academic Research Center (STARC) |
| Date | 2005-09-09 |
| Paper # | CPM2005-103,ICD2005-113 |
| Volume (vol) | vol.105 |
| Number (no) | 268 |
| Page | pp.pp.- |
| #Pages | 6 |
| Date of Issue | |