Presentation | 2005-09-08 Characteristic dielectric constant for polyimide thin films at 10GHz Sigemasa Segawa, Sachiko Ito, Katsuya Kikuchi, Kazuhiko Tokoro, Hiroshi Nakagawa, Masahiro Aoyagi, |
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Abstract(in Japanese) | (See Japanese page) |
Abstract(in English) | In order to realize improvement in the high-speed and high-density integration, a low dielectric property material should be developed. In order to perform development of a low dielectric material quickly, the simple and highly precise dielectric property measurement system is required. The cavity resonance perturbation method was chosen in dielectric property measuring methods of a high frequency band, and we investigated so that it could measure with high precision. The measurement system was calibrated by using synthetic quartz as a standard material of dielectric property. Moreover, the measurement condition of a vector network analyzer (VNA) was optimized. The ultra-thin polyimide film could be measured successfully. |
Keyword(in Japanese) | (See Japanese page) |
Keyword(in English) | Cavity Resonance Perturbation Method / quart / Vector Network Analyzer / IFBW / Polyimide / Thin Film |
Paper # | CPM2005-86,ICD2005-96 |
Date of Issue |
Conference Information | |
Committee | CPM |
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Conference Date | 2005/9/1(1days) |
Place (in Japanese) | (See Japanese page) |
Place (in English) | |
Topics (in Japanese) | (See Japanese page) |
Topics (in English) | |
Chair | |
Vice Chair | |
Secretary | |
Assistant |
Paper Information | |
Registration To | Component Parts and Materials (CPM) |
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Language | JPN |
Title (in Japanese) | (See Japanese page) |
Sub Title (in Japanese) | (See Japanese page) |
Title (in English) | Characteristic dielectric constant for polyimide thin films at 10GHz |
Sub Title (in English) | |
Keyword(1) | Cavity Resonance Perturbation Method |
Keyword(2) | quart |
Keyword(3) | Vector Network Analyzer |
Keyword(4) | IFBW |
Keyword(5) | Polyimide |
Keyword(6) | Thin Film |
1st Author's Name | Sigemasa Segawa |
1st Author's Affiliation | PI R&D Co., LTD() |
2nd Author's Name | Sachiko Ito |
2nd Author's Affiliation | AIST |
3rd Author's Name | Katsuya Kikuchi |
3rd Author's Affiliation | AIST |
4th Author's Name | Kazuhiko Tokoro |
4th Author's Affiliation | AIST |
5th Author's Name | Hiroshi Nakagawa |
5th Author's Affiliation | AIST |
6th Author's Name | Masahiro Aoyagi |
6th Author's Affiliation | AIST |
Date | 2005-09-08 |
Paper # | CPM2005-86,ICD2005-96 |
Volume (vol) | vol.105 |
Number (no) | 265 |
Page | pp.pp.- |
#Pages | 5 |
Date of Issue |