Presentation 2005-09-08
Characteristic dielectric constant for polyimide thin films at 10GHz
Sigemasa Segawa, Sachiko Ito, Katsuya Kikuchi, Kazuhiko Tokoro, Hiroshi Nakagawa, Masahiro Aoyagi,
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Abstract(in Japanese) (See Japanese page)
Abstract(in English) In order to realize improvement in the high-speed and high-density integration, a low dielectric property material should be developed. In order to perform development of a low dielectric material quickly, the simple and highly precise dielectric property measurement system is required. The cavity resonance perturbation method was chosen in dielectric property measuring methods of a high frequency band, and we investigated so that it could measure with high precision. The measurement system was calibrated by using synthetic quartz as a standard material of dielectric property. Moreover, the measurement condition of a vector network analyzer (VNA) was optimized. The ultra-thin polyimide film could be measured successfully.
Keyword(in Japanese) (See Japanese page)
Keyword(in English) Cavity Resonance Perturbation Method / quart / Vector Network Analyzer / IFBW / Polyimide / Thin Film
Paper # CPM2005-86,ICD2005-96
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Conference Information
Committee CPM
Conference Date 2005/9/1(1days)
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Paper Information
Registration To Component Parts and Materials (CPM)
Language JPN
Title (in Japanese) (See Japanese page)
Sub Title (in Japanese) (See Japanese page)
Title (in English) Characteristic dielectric constant for polyimide thin films at 10GHz
Sub Title (in English)
Keyword(1) Cavity Resonance Perturbation Method
Keyword(2) quart
Keyword(3) Vector Network Analyzer
Keyword(4) IFBW
Keyword(5) Polyimide
Keyword(6) Thin Film
1st Author's Name Sigemasa Segawa
1st Author's Affiliation PI R&D Co., LTD()
2nd Author's Name Sachiko Ito
2nd Author's Affiliation AIST
3rd Author's Name Katsuya Kikuchi
3rd Author's Affiliation AIST
4th Author's Name Kazuhiko Tokoro
4th Author's Affiliation AIST
5th Author's Name Hiroshi Nakagawa
5th Author's Affiliation AIST
6th Author's Name Masahiro Aoyagi
6th Author's Affiliation AIST
Date 2005-09-08
Paper # CPM2005-86,ICD2005-96
Volume (vol) vol.105
Number (no) 265
Page pp.pp.-
#Pages 5
Date of Issue