Presentation | 1994/3/18 Newly Developed Activated Fault Imaging Technique for LSI Fault Localization Toyokazu Nakamura, Yasuko Hanagama, Hidegi Ogane, Kenji Morohashi, |
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Abstract(in Japanese) | (See Japanese page) |
Abstract(in English) | Because of increasing die size and higher circuit integration in LSI technology,failure analysis of LSIs is becoming more difficult and time-cosuming.LSI fault localization method,using voltage contrast image developed by NEC,is very effective in reducing failure analysis time.The method has been applied to failure analysis of many kinds of Logic LSI,and we have succeeded in analyzing the samples in 90%of cases. |
Keyword(in Japanese) | (See Japanese page) |
Keyword(in English) | Voltage contrast image / Logic LSI / Fault localization / EB tester |
Paper # | R93-75,CPM93-141 |
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Conference Information | |
Committee | R |
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Conference Date | 1994/3/18(1days) |
Place (in Japanese) | (See Japanese page) |
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Topics (in Japanese) | (See Japanese page) |
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Paper Information | |
Registration To | Reliability(R) |
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Language | JPN |
Title (in Japanese) | (See Japanese page) |
Sub Title (in Japanese) | (See Japanese page) |
Title (in English) | Newly Developed Activated Fault Imaging Technique for LSI Fault Localization |
Sub Title (in English) | |
Keyword(1) | Voltage contrast image |
Keyword(2) | Logic LSI |
Keyword(3) | Fault localization |
Keyword(4) | EB tester |
1st Author's Name | Toyokazu Nakamura |
1st Author's Affiliation | NEC() |
2nd Author's Name | Yasuko Hanagama |
2nd Author's Affiliation | NEC |
3rd Author's Name | Hidegi Ogane |
3rd Author's Affiliation | NEC Glass Component |
4th Author's Name | Kenji Morohashi |
4th Author's Affiliation | Schulumberger K.K. |
Date | 1994/3/18 |
Paper # | R93-75,CPM93-141 |
Volume (vol) | vol.93 |
Number (no) | 522 |
Page | pp.pp.- |
#Pages | 4 |
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