| Presentation | 2004/10/15 Fine patterning of nitride semiconductors and fabrication of distributed Bragg reflector mirrors by focused ion beam Yoshitaka Hatada, Teruhisa Kotani, Mitsuru Funato, Yukio Narukawa, Takashi Mukai, Yoichi Kawakami, |
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| PDF Download Page | PDF download Page Link |
| Abstract(in Japanese) | (See Japanese page) |
| Abstract(in English) | Fine-patterning of nitride semiconductors, which is a key material for optical applications in the short wavelength range, was performed, using a focused ion beam (FIB) technique. The etching characteristics were investigated and air/GaN distributed Bragg reflector (DBR) mirrors were fabricated. The root-mean-square roughness of the sidewall of etched area was measured by atomic force microscopy to be 0.5-0.8 nm. Namely, the etched surface was optically smooth, and so we fabricated air/GaN DBR mirrors at the end of laser cavities as a test structure. The internal loss factor was firstly evaluated to be 42 cm^<-1> and using this quantity the reflectivity of the fabricated DBR mirrors was estimated to be 62%, which was much higher than that of conventional facet mirrors (17%). |
| Keyword(in Japanese) | (See Japanese page) |
| Keyword(in English) | nitride semiconductor / focused ion beam / distributed Bragg reflector |
| Paper # | ED2004-147,CPM2004-121,LQE2004-85 |
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| Conference Information | |
| Committee | LQE |
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| Conference Date | 2004/10/15(1days) |
| Place (in Japanese) | (See Japanese page) |
| Place (in English) | |
| Topics (in Japanese) | (See Japanese page) |
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| Paper Information | |
| Registration To | Lasers and Quantum Electronics (LQE) |
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| Language | JPN |
| Title (in Japanese) | (See Japanese page) |
| Sub Title (in Japanese) | (See Japanese page) |
| Title (in English) | Fine patterning of nitride semiconductors and fabrication of distributed Bragg reflector mirrors by focused ion beam |
| Sub Title (in English) | |
| Keyword(1) | nitride semiconductor |
| Keyword(2) | focused ion beam |
| Keyword(3) | distributed Bragg reflector |
| 1st Author's Name | Yoshitaka Hatada |
| 1st Author's Affiliation | Department of Electronic Science and Engineering, Kyoto University() |
| 2nd Author's Name | Teruhisa Kotani |
| 2nd Author's Affiliation | Department of Electronic Science and Engineering, Kyoto University |
| 3rd Author's Name | Mitsuru Funato |
| 3rd Author's Affiliation | Department of Electronic Science and Engineering, Kyoto University |
| 4th Author's Name | Yukio Narukawa |
| 4th Author's Affiliation | Nitride Semiconductor Research Lab. Nichia Corporation |
| 5th Author's Name | Takashi Mukai |
| 5th Author's Affiliation | Nitride Semiconductor Research Lab. Nichia Corporation |
| 6th Author's Name | Yoichi Kawakami |
| 6th Author's Affiliation | Department of Electronic Science and Engineering, Kyoto University |
| Date | 2004/10/15 |
| Paper # | ED2004-147,CPM2004-121,LQE2004-85 |
| Volume (vol) | vol.104 |
| Number (no) | 362 |
| Page | pp.pp.- |
| #Pages | 6 |
| Date of Issue | |