Presentation | 2004/10/15 Improvement in Performance of AlGaN/GaN HFETs by utilizing a Low-Temperature GaN Cap Layer Tadayoshi DEGUCHI, Eiji WAKI, Satoru ONO, Atsushi NAKAGAWA, Hiroyasu Ishikawa, Takashi EGAWA, |
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Abstract(in Japanese) | (See Japanese page) |
Abstract(in English) | AlGaN/GaN heterostructure field-effect transistors(HFETs) with a highly resistive low-temperature(LT) GaN cap layer on the conventional HFET epitaxial structure were fabricated. We found that this approach could significantly reduce the gate leakage current and achieve a high turn-on voltage for Schottky barrier diodes. HFETs with the LT-GaN layer showed a large gate voltage swing up to Vg=3V with higher linearity, as compared to conventional HFETs. Moreover, no current collapse was observed in the novel HFETs under pulse-mode gate stress. This results demonstrate that the application of a LT-GaN cap layer to serve as a gate insulator and to provide surface passivation is a promising technique for improving the surface stability of AlGaN/GaN HFETs. |
Keyword(in Japanese) | (See Japanese page) |
Keyword(in English) | AlGaN/GaN / HFET / gate leakage / current collapse / LT-GaN |
Paper # | ED2004-136,CPM2004-110,LQE2004-74 |
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Conference Information | |
Committee | LQE |
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Conference Date | 2004/10/15(1days) |
Place (in Japanese) | (See Japanese page) |
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Topics (in Japanese) | (See Japanese page) |
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Paper Information | |
Registration To | Lasers and Quantum Electronics (LQE) |
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Language | JPN |
Title (in Japanese) | (See Japanese page) |
Sub Title (in Japanese) | (See Japanese page) |
Title (in English) | Improvement in Performance of AlGaN/GaN HFETs by utilizing a Low-Temperature GaN Cap Layer |
Sub Title (in English) | |
Keyword(1) | AlGaN/GaN |
Keyword(2) | HFET |
Keyword(3) | gate leakage |
Keyword(4) | current collapse |
Keyword(5) | LT-GaN |
1st Author's Name | Tadayoshi DEGUCHI |
1st Author's Affiliation | Research Laboratory, New Japan Radio Co., Ltd.() |
2nd Author's Name | Eiji WAKI |
2nd Author's Affiliation | Research Laboratory, New Japan Radio Co., Ltd. |
3rd Author's Name | Satoru ONO |
3rd Author's Affiliation | Research Laboratory, New Japan Radio Co., Ltd. |
4th Author's Name | Atsushi NAKAGAWA |
4th Author's Affiliation | Research Laboratory, New Japan Radio Co., Ltd. |
5th Author's Name | Hiroyasu Ishikawa |
5th Author's Affiliation | Research Center for Nano-Device and System, Nagoya Institute of Technology |
6th Author's Name | Takashi EGAWA |
6th Author's Affiliation | Research Center for Nano-Device and System, Nagoya Institute of Technology |
Date | 2004/10/15 |
Paper # | ED2004-136,CPM2004-110,LQE2004-74 |
Volume (vol) | vol.104 |
Number (no) | 362 |
Page | pp.pp.- |
#Pages | 5 |
Date of Issue |