Presentation 2004/10/15
Improvement in Performance of AlGaN/GaN HFETs by utilizing a Low-Temperature GaN Cap Layer
Tadayoshi DEGUCHI, Eiji WAKI, Satoru ONO, Atsushi NAKAGAWA, Hiroyasu Ishikawa, Takashi EGAWA,
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Abstract(in English) AlGaN/GaN heterostructure field-effect transistors(HFETs) with a highly resistive low-temperature(LT) GaN cap layer on the conventional HFET epitaxial structure were fabricated. We found that this approach could significantly reduce the gate leakage current and achieve a high turn-on voltage for Schottky barrier diodes. HFETs with the LT-GaN layer showed a large gate voltage swing up to Vg=3V with higher linearity, as compared to conventional HFETs. Moreover, no current collapse was observed in the novel HFETs under pulse-mode gate stress. This results demonstrate that the application of a LT-GaN cap layer to serve as a gate insulator and to provide surface passivation is a promising technique for improving the surface stability of AlGaN/GaN HFETs.
Keyword(in Japanese) (See Japanese page)
Keyword(in English) AlGaN/GaN / HFET / gate leakage / current collapse / LT-GaN
Paper # ED2004-136,CPM2004-110,LQE2004-74
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Conference Information
Committee LQE
Conference Date 2004/10/15(1days)
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Registration To Lasers and Quantum Electronics (LQE)
Language JPN
Title (in Japanese) (See Japanese page)
Sub Title (in Japanese) (See Japanese page)
Title (in English) Improvement in Performance of AlGaN/GaN HFETs by utilizing a Low-Temperature GaN Cap Layer
Sub Title (in English)
Keyword(1) AlGaN/GaN
Keyword(2) HFET
Keyword(3) gate leakage
Keyword(4) current collapse
Keyword(5) LT-GaN
1st Author's Name Tadayoshi DEGUCHI
1st Author's Affiliation Research Laboratory, New Japan Radio Co., Ltd.()
2nd Author's Name Eiji WAKI
2nd Author's Affiliation Research Laboratory, New Japan Radio Co., Ltd.
3rd Author's Name Satoru ONO
3rd Author's Affiliation Research Laboratory, New Japan Radio Co., Ltd.
4th Author's Name Atsushi NAKAGAWA
4th Author's Affiliation Research Laboratory, New Japan Radio Co., Ltd.
5th Author's Name Hiroyasu Ishikawa
5th Author's Affiliation Research Center for Nano-Device and System, Nagoya Institute of Technology
6th Author's Name Takashi EGAWA
6th Author's Affiliation Research Center for Nano-Device and System, Nagoya Institute of Technology
Date 2004/10/15
Paper # ED2004-136,CPM2004-110,LQE2004-74
Volume (vol) vol.104
Number (no) 362
Page pp.pp.-
#Pages 5
Date of Issue