Presentation 2004/10/14
MOVPE growth of AlGaN with low dislocation density using rugged AlN epilayer
Akira ISHIGA, Takashi ONISHI, Yuhuai LIU, Masaya HARAGUCHI, Noriyuki KUWANO, Tomohiko SHIBATA, Mitsuhiro TANAKA, Hideto MIYAKE, Kazumasa HIRAMATSU,
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Abstract(in English) AlGaN with high AlN molar fraction and low dislocation density is necessary for fabricating deep -UV emitters and detectors. In this study, the reduction of dislocation density of AlGaN in the whole area of surface was achieved by low-pressure MOVPE using continuous rugged epitaxial AlN substrate. The AlN molar fraction of the crack-free AlGaN is 0.51, and atomic steps in the surface are clearly observed by AFM. In addition, the dislocation density is estimated to be 8.8×10^7cm^<-2> from CL measurement, which is two orders lower than that of AlGaN grown on flat AlN epitaxial layer. The above results indicate that the dislocation density of AlGaN can be reduced greatly by adopting rugged AlN epitaxial substrate with continuous inclined facet.
Keyword(in Japanese) (See Japanese page)
Keyword(in English) AlGaN / GaN / GaN / LP-MOVPE / epitaxial AlN film
Paper # ED2004-120,CPM2004-94,LQE2004-58
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Committee LQE
Conference Date 2004/10/14(1days)
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Registration To Lasers and Quantum Electronics (LQE)
Language JPN
Title (in Japanese) (See Japanese page)
Sub Title (in Japanese) (See Japanese page)
Title (in English) MOVPE growth of AlGaN with low dislocation density using rugged AlN epilayer
Sub Title (in English)
Keyword(1) AlGaN
Keyword(2) GaN
Keyword(3) GaN
Keyword(4) LP-MOVPE
Keyword(5) epitaxial AlN film
1st Author's Name Akira ISHIGA
1st Author's Affiliation Faculty of Eng., Mie University()
2nd Author's Name Takashi ONISHI
2nd Author's Affiliation Faculty of Eng., Mie University
3rd Author's Name Yuhuai LIU
3rd Author's Affiliation Satellite Venture Business Lab., Mie University
4th Author's Name Masaya HARAGUCHI
4th Author's Affiliation Interdisciplinary Graduate School of Engineering Sciences, Kyusyu University
5th Author's Name Noriyuki KUWANO
5th Author's Affiliation Art, Science and Technology Center for Cooperative Reserch, Kyusyu University
6th Author's Name Tomohiko SHIBATA
6th Author's Affiliation NGK Insulators, Ltd.
7th Author's Name Mitsuhiro TANAKA
7th Author's Affiliation NGK Insulators, Ltd.
8th Author's Name Hideto MIYAKE
8th Author's Affiliation Faculty of Eng., Mie University
9th Author's Name Kazumasa HIRAMATSU
9th Author's Affiliation Faculty of Eng., Mie University
Date 2004/10/14
Paper # ED2004-120,CPM2004-94,LQE2004-58
Volume (vol) vol.104
Number (no) 361
Page pp.pp.-
#Pages 4
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