| Presentation | 2004/10/1 Fabrication of optical waveguide structure by fs-laser lithography Shinya SHIBATA, Okihiro SUGIHARA, Toshikuni KAINO, Haridas E. Pudavar, James O'Rielly, Paras N. Prasad, |
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| PDF Download Page | PDF download Page Link |
| Abstract(in Japanese) | (See Japanese page) |
| Abstract(in English) | fs-laser lithography has various advantages such as high resolution and three-dimensional structure hi a transparent material by two- or multi-photon absorption reaction. In this work, we considered about the fabrication of rating structures, controlling of two photon reaction area and formation of optical waveguide structure in polymer films. Four kinds of two-photon dye and two kinds of UV curable acrylate type monomer, Desobond 105 and 9D9-464 were used. The polymerized grating structures were observed in every dye with a variety of concentration (2.5～0.25wt%). The dye doped PMMA thick film was formed, and a cross-sectional fluorescence change was observed by confocal microscope. The fluorescence took an ellipsoidal form, but the symmetrical structure could be fabricated by giving the suitable line interval and the number of times. And then, the 4.8x4.3um2 size straight-line structure was fabricated and by confirming the near field pattern of the coupled light (1300nm) from the cross section, an optical waveguide was obtained. |
| Keyword(in Japanese) | (See Japanese page) |
| Keyword(in English) | fs-laser / two photon absorption / Laser Lithography / Optical Waveguide |
| Paper # | OME2004-83,OPE2004-146 |
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| Conference Information | |
| Committee | OPE |
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| Conference Date | 2004/10/1(1days) |
| Place (in Japanese) | (See Japanese page) |
| Place (in English) | |
| Topics (in Japanese) | (See Japanese page) |
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| Paper Information | |
| Registration To | Optoelectronics (OPE) |
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| Language | JPN |
| Title (in Japanese) | (See Japanese page) |
| Sub Title (in Japanese) | (See Japanese page) |
| Title (in English) | Fabrication of optical waveguide structure by fs-laser lithography |
| Sub Title (in English) | |
| Keyword(1) | fs-laser |
| Keyword(2) | two photon absorption |
| Keyword(3) | Laser Lithography |
| Keyword(4) | Optical Waveguide |
| 1st Author's Name | Shinya SHIBATA |
| 1st Author's Affiliation | Institute of Multidisciplinary Research for Advanced Materials, Tohoku University() |
| 2nd Author's Name | Okihiro SUGIHARA |
| 2nd Author's Affiliation | Institute of Multidisciplinary Research for Advanced Materials, Tohoku University |
| 3rd Author's Name | Toshikuni KAINO |
| 3rd Author's Affiliation | Institute of Multidisciplinary Research for Advanced Materials, Tohoku University |
| 4th Author's Name | Haridas E. Pudavar |
| 4th Author's Affiliation | Institute for Lasers, Photonics & BioPhotonics, State University of New York at Buffalo |
| 5th Author's Name | James O'Rielly |
| 5th Author's Affiliation | Institute for Lasers, Photonics & BioPhotonics, State University of New York at Buffalo |
| 6th Author's Name | Paras N. Prasad |
| 6th Author's Affiliation | Institute for Lasers, Photonics & BioPhotonics, State University of New York at Buffalo |
| Date | 2004/10/1 |
| Paper # | OME2004-83,OPE2004-146 |
| Volume (vol) | vol.104 |
| Number (no) | 333 |
| Page | pp.pp.- |
| #Pages | 6 |
| Date of Issue | |