Presentation | 2005/6/21 A Comprehensive Study of Punchthrough Characteristics in Multiple-Gate MOSFETs : The Trend of Punchthrough Voltages in Various Gate Shapes of SOI MOSFETs(Advanced Si Devices) Hyun Sik Kang, Seong Wan Ryu, Yang Kyu Choi, |
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PDF Download Page | PDF download Page Link |
Abstract(in Japanese) | (See Japanese page) |
Abstract(in English) | Punchthrough characteristics are investigated for different gate structures on silicon-on-insulator (SOI) FinFET. The punchthrough voltage (V_ |
Keyword(in Japanese) | (See Japanese page) |
Keyword(in English) | Punchthrough / SOI / FinFET / Multiple-gate / Fin Width |
Paper # | ED2005-81,SDM2005-101 |
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Conference Information | |
Committee | SDM |
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Conference Date | 2005/6/21(1days) |
Place (in Japanese) | (See Japanese page) |
Place (in English) | |
Topics (in Japanese) | (See Japanese page) |
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Paper Information | |
Registration To | Silicon Device and Materials (SDM) |
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Language | ENG |
Title (in Japanese) | (See Japanese page) |
Sub Title (in Japanese) | (See Japanese page) |
Title (in English) | A Comprehensive Study of Punchthrough Characteristics in Multiple-Gate MOSFETs : The Trend of Punchthrough Voltages in Various Gate Shapes of SOI MOSFETs(Advanced Si Devices) |
Sub Title (in English) | |
Keyword(1) | Punchthrough |
Keyword(2) | SOI |
Keyword(3) | FinFET |
Keyword(4) | Multiple-gate |
Keyword(5) | Fin Width |
1st Author's Name | Hyun Sik Kang |
1st Author's Affiliation | Dept. of EECS, KAIST() |
2nd Author's Name | Seong Wan Ryu |
2nd Author's Affiliation | Dept. of EECS, KAIST |
3rd Author's Name | Yang Kyu Choi |
3rd Author's Affiliation | Dept. of EECS, KAIST |
Date | 2005/6/21 |
Paper # | ED2005-81,SDM2005-101 |
Volume (vol) | vol.105 |
Number (no) | 155 |
Page | pp.pp.- |
#Pages | 4 |
Date of Issue |