| Presentation | 2005/6/2 Thermal stability of HfO_2 and its alloys as gate dielectric materials : Molecular dynamics simulation Chioko KANETA, Takahiro YAMASAKI, Yuko KOSAKA, |
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| PDF Download Page | PDF download Page Link |
| Abstract(in Japanese) | (See Japanese page) |
| Abstract(in English) | Hf-based alloys are considered to be the promising candidates for the high-dielectric-constant gate dielectric materials in future CMOS. Under thermal treatments during the fabrication processes, they often change their compositions and become inhomogeneous, due to the crystallization, phase separation, and mixing with the ultrathin interfacial SiO_2 layers formed between the Si substrate. We investigated the thermal properties of the Hf-based alloys of various compositions, by employing the classical molecular dynamics method. The composition dependence of the crystallization and phase separation mechanism, and the growth mechanism of the crystal nucleus of HfO_2 are clarified. The remarkable difference of the diffisibility of Hf atoms into the interfacial SiO_2 layer and that of Si atoms into the Hf-silicate is also shown. |
| Keyword(in Japanese) | (See Japanese page) |
| Keyword(in English) | high-k / HfO_2 / gate dielectrics / thermal stability / molecular dynamics |
| Paper # | SDM2005-67 |
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| Conference Information | |
| Committee | SDM |
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| Conference Date | 2005/6/2(1days) |
| Place (in Japanese) | (See Japanese page) |
| Place (in English) | |
| Topics (in Japanese) | (See Japanese page) |
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| Paper Information | |
| Registration To | Silicon Device and Materials (SDM) |
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| Language | JPN |
| Title (in Japanese) | (See Japanese page) |
| Sub Title (in Japanese) | (See Japanese page) |
| Title (in English) | Thermal stability of HfO_2 and its alloys as gate dielectric materials : Molecular dynamics simulation |
| Sub Title (in English) | |
| Keyword(1) | high-k |
| Keyword(2) | HfO_2 |
| Keyword(3) | gate dielectrics |
| Keyword(4) | thermal stability |
| Keyword(5) | molecular dynamics |
| 1st Author's Name | Chioko KANETA |
| 1st Author's Affiliation | Fujitsu Laboratories Ltd.() |
| 2nd Author's Name | Takahiro YAMASAKI |
| 2nd Author's Affiliation | Fujitsu Laboratories Ltd. |
| 3rd Author's Name | Yuko KOSAKA |
| 3rd Author's Affiliation | Fujitsu Laboratories Ltd. |
| Date | 2005/6/2 |
| Paper # | SDM2005-67 |
| Volume (vol) | vol.105 |
| Number (no) | 108 |
| Page | pp.pp.- |
| #Pages | 6 |
| Date of Issue | |