| Presentation | 2005/6/2 Estimation of the optical dielectric constant for HfSiOx thin film by using XPS and AES N. Suzuki, M. Yamawaki, K. Torii, T. Kawahara, K. Hirose, |
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| PDF Download Page | PDF download Page Link |
| Abstract(in Japanese) | (See Japanese page) |
| Abstract(in English) | The Auger parameter of thin HfSiOx films is measured by using XPS and AES. The optical dielectric constant of the HfSiOx films is deduced from the measured Auger parameter. It is found that the optical dielectric constant varies depending on the post-deposition annealing conditions. |
| Keyword(in Japanese) | (See Japanese page) |
| Keyword(in English) | HfSiOx / XPS / AES / optical dielectric constant |
| Paper # | SDM2005-61 |
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| Conference Information | |
| Committee | SDM |
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| Conference Date | 2005/6/2(1days) |
| Place (in Japanese) | (See Japanese page) |
| Place (in English) | |
| Topics (in Japanese) | (See Japanese page) |
| Topics (in English) | |
| Chair | |
| Vice Chair | |
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| Paper Information | |
| Registration To | Silicon Device and Materials (SDM) |
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| Language | JPN |
| Title (in Japanese) | (See Japanese page) |
| Sub Title (in Japanese) | (See Japanese page) |
| Title (in English) | Estimation of the optical dielectric constant for HfSiOx thin film by using XPS and AES |
| Sub Title (in English) | |
| Keyword(1) | HfSiOx |
| Keyword(2) | XPS |
| Keyword(3) | AES |
| Keyword(4) | optical dielectric constant |
| 1st Author's Name | N. Suzuki |
| 1st Author's Affiliation | Grad. Univ. Advanced. Studies() |
| 2nd Author's Name | M. Yamawaki |
| 2nd Author's Affiliation | Grad. Univ. Advanced. Studies |
| 3rd Author's Name | K. Torii |
| 3rd Author's Affiliation | SELETE |
| 4th Author's Name | T. Kawahara |
| 4th Author's Affiliation | SELETE |
| 5th Author's Name | K. Hirose |
| 5th Author's Affiliation | Grad. Univ. Advanced. Studies:ISAS |
| Date | 2005/6/2 |
| Paper # | SDM2005-61 |
| Volume (vol) | vol.105 |
| Number (no) | 108 |
| Page | pp.pp.- |
| #Pages | 5 |
| Date of Issue | |