| Presentation | 2005/1/24 Pore-structure Control of Interlayer Dielectric Films for Low-power Operational ULSI Devices Yoshihiro Hayashi, Fuminori Itoh, Munehiro Tada, Hiroto Ohtake, Masayuki Tagami, Makoto Ueki, Kenichiro Hijioka, Mari Abe, |
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| PDF Download Page | PDF download Page Link |
| Abstract(in Japanese) | (See Japanese page) |
| Abstract(in English) | A porous SiOCH film is developed by a new concept PECVD, in which pore-involved molecules are piled up together to deposit a "molecular-pore stacked, SiOCH (MPS)" film. The pore size and the density of the film are controlled by designing the pore size and the steric-hindrance side-chains of the source molecules. The basic feasibility of the MPS film was confirmed through the integration into Cu damascene interconnects. The MPS film is a strong candidate for the low-k, inter-metal-dielectrics film in 65nm/45nm-node, low-power ULSI devices. |
| Keyword(in Japanese) | (See Japanese page) |
| Keyword(in English) | Porous low-k film / plasma-polymerization / Cu interconnects / ULSI |
| Paper # | SDM2004-246 |
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| Conference Information | |
| Committee | SDM |
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| Conference Date | 2005/1/24(1days) |
| Place (in Japanese) | (See Japanese page) |
| Place (in English) | |
| Topics (in Japanese) | (See Japanese page) |
| Topics (in English) | |
| Chair | |
| Vice Chair | |
| Secretary | |
| Assistant | |
| Paper Information | |
| Registration To | Silicon Device and Materials (SDM) |
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| Language | JPN |
| Title (in Japanese) | (See Japanese page) |
| Sub Title (in Japanese) | (See Japanese page) |
| Title (in English) | Pore-structure Control of Interlayer Dielectric Films for Low-power Operational ULSI Devices |
| Sub Title (in English) | |
| Keyword(1) | Porous low-k film |
| Keyword(2) | plasma-polymerization |
| Keyword(3) | Cu interconnects |
| Keyword(4) | ULSI |
| 1st Author's Name | Yoshihiro Hayashi |
| 1st Author's Affiliation | System Devices Research Laboratories, NEC() |
| 2nd Author's Name | Fuminori Itoh |
| 2nd Author's Affiliation | System Devices Research Laboratories, NEC |
| 3rd Author's Name | Munehiro Tada |
| 3rd Author's Affiliation | System Devices Research Laboratories, NEC |
| 4th Author's Name | Hiroto Ohtake |
| 4th Author's Affiliation | System Devices Research Laboratories, NEC |
| 5th Author's Name | Masayuki Tagami |
| 5th Author's Affiliation | System Devices Research Laboratories, NEC |
| 6th Author's Name | Makoto Ueki |
| 6th Author's Affiliation | System Devices Research Laboratories, NEC |
| 7th Author's Name | Kenichiro Hijioka |
| 7th Author's Affiliation | System Devices Research Laboratories, NEC |
| 8th Author's Name | Mari Abe |
| 8th Author's Affiliation | System Devices Research Laboratories, NEC |
| Date | 2005/1/24 |
| Paper # | SDM2004-246 |
| Volume (vol) | vol.104 |
| Number (no) | 645 |
| Page | pp.pp.- |
| #Pages | 6 |
| Date of Issue | |