| Presentation | 2005/1/24 Metallization using Supercritical Carbon Dioxide Fluids E. Kondoh, |
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| PDF Download Page | PDF download Page Link |
| Abstract(in Japanese) | (See Japanese page) |
| Abstract(in English) | Ruthenium has been of interest in applying to ULSI capacitor electrodes and more recently as a barrier metal against Cu diffusion. Thin film deposition from supercritical CO_2 has gained particular attention as a new deposition technique that provides nano penetration capability and a possibility of developing new deposition chemistries. In this article, deposition characteristics of Ru thin films using H_2 reduction chemistry were described first. It was found that Ru films grow only on conductive surfaces when the H_2 reduction chemistry was employed. This phenomenon can be beneficial for some specific applications, however is not very much favored as a general deposition technology. Secondary this paper reports our finding that Ru films, oxygen-containing Ru films in fact, grew on dielectric/non-conductive surfaces when oxidative chemistry was used instead. O_3 was used as an oxidant for thin film deposition from supercritical fluids for the first time. The use of O_3 promotes heterogenous nucleation and increases the amount of oxygen in the films. The oxygen-containing Ru was reduced by another reduction run using supercritical CO_2. Finally, by using the oxygen-containing Ru layer as a seed layer for Cu deposition, it was succeeded to fabricate Cu/Ru/dielectric stacked structures. |
| Keyword(in Japanese) | (See Japanese page) |
| Keyword(in English) | Ru thin films / Supercritical Fluid / Interconnects / Ozone |
| Paper # | SDM2004-244 |
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| Conference Information | |
| Committee | SDM |
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| Conference Date | 2005/1/24(1days) |
| Place (in Japanese) | (See Japanese page) |
| Place (in English) | |
| Topics (in Japanese) | (See Japanese page) |
| Topics (in English) | |
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| Vice Chair | |
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| Paper Information | |
| Registration To | Silicon Device and Materials (SDM) |
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| Language | JPN |
| Title (in Japanese) | (See Japanese page) |
| Sub Title (in Japanese) | (See Japanese page) |
| Title (in English) | Metallization using Supercritical Carbon Dioxide Fluids |
| Sub Title (in English) | |
| Keyword(1) | Ru thin films |
| Keyword(2) | Supercritical Fluid |
| Keyword(3) | Interconnects |
| Keyword(4) | Ozone |
| 1st Author's Name | E. Kondoh |
| 1st Author's Affiliation | University of Yamanashi() |
| Date | 2005/1/24 |
| Paper # | SDM2004-244 |
| Volume (vol) | vol.104 |
| Number (no) | 645 |
| Page | pp.pp.- |
| #Pages | 4 |
| Date of Issue | |