| Presentation | 2005/1/24 Evaluation of pores in low-k porous silica films incorporated with ethylene groups Yasutaka UCHIDA, Toshiyuki OHDAIRA, Ryoichi SUZUKI, Yoshiyuki MARUYAMA, Tomohiro KATOH, Koichi ISHIDA, |
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| PDF Download Page | PDF download Page Link |
| Abstract(in Japanese) | (See Japanese page) |
| Abstract(in English) | Pore size distribution (PSD) of porous silica films incorporated with ethylene groups was investigated by several analysis methods. PSDs evaluated by small angle x-ray scattering and positron annihilation lifetime spectroscopy (PALS) were twice as large as that obtained by N_2 gas isotherm at 77K, and their average sizes were about 2nm. According to PALS measurement, the pore structure of the films was connected-open pores. Temperature dependence of porogen desorption from low-k silica films incorporated with ethylene groups are also investigated. Three-hour annealing was required in the case of 400℃, while 8-hour annealing was required in the case of 375℃. |
| Keyword(in Japanese) | (See Japanese page) |
| Keyword(in English) | low-k / pore-size distribution / PALS / TDS |
| Paper # | SDM2004-238 |
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| Conference Information | |
| Committee | SDM |
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| Conference Date | 2005/1/24(1days) |
| Place (in Japanese) | (See Japanese page) |
| Place (in English) | |
| Topics (in Japanese) | (See Japanese page) |
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| Paper Information | |
| Registration To | Silicon Device and Materials (SDM) |
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| Language | JPN |
| Title (in Japanese) | (See Japanese page) |
| Sub Title (in Japanese) | (See Japanese page) |
| Title (in English) | Evaluation of pores in low-k porous silica films incorporated with ethylene groups |
| Sub Title (in English) | |
| Keyword(1) | low-k |
| Keyword(2) | pore-size distribution |
| Keyword(3) | PALS |
| Keyword(4) | TDS |
| 1st Author's Name | Yasutaka UCHIDA |
| 1st Author's Affiliation | Faculty of Science and Technology, Teikyo University of Science and Technology() |
| 2nd Author's Name | Toshiyuki OHDAIRA |
| 2nd Author's Affiliation | Research Institute of Instrumentation Frontier, National Institute of Advanced Industrial Science and Technology |
| 3rd Author's Name | Ryoichi SUZUKI |
| 3rd Author's Affiliation | Research Institute of Instrumentation Frontier, National Institute of Advanced Industrial Science and Technology |
| 4th Author's Name | Yoshiyuki MARUYAMA |
| 4th Author's Affiliation | Faculty of Science and Technology, Teikyo University of Science and Technology |
| 5th Author's Name | Tomohiro KATOH |
| 5th Author's Affiliation | Faculty of Science and Technology, Teikyo University of Science and Technology |
| 6th Author's Name | Koichi ISHIDA |
| 6th Author's Affiliation | Faculty of Science and Technology, Teikyo University of Science and Technology |
| Date | 2005/1/24 |
| Paper # | SDM2004-238 |
| Volume (vol) | vol.104 |
| Number (no) | 645 |
| Page | pp.pp.- |
| #Pages | 6 |
| Date of Issue | |