Presentation 2004/12/9
Development of diamond electron source : Fabrication of sharp tip and electron emission properties for P-doped diamond films
Yoshiki NISHIBAYASHI, Natsuo TATSUMI, Akihiko NAMBA, Takahiro IMAI,
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Abstract(in English) The authors have developed fabrication technique of diamond tips for electron emitter and have studied P-doped epitaxial film because the n-type film which have Fermi level at higher level is effective for electron emitter in comparison with p-type film. The authors report on electron emission properties from P-doped epitaxial emitter.
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Keyword(in English) Diamond / Micro-fabrication / n-type film / Electron source
Paper # ED2004-192
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Committee ED
Conference Date 2004/12/9(1days)
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Registration To Electron Devices (ED)
Language JPN
Title (in Japanese) (See Japanese page)
Sub Title (in Japanese) (See Japanese page)
Title (in English) Development of diamond electron source : Fabrication of sharp tip and electron emission properties for P-doped diamond films
Sub Title (in English)
Keyword(1) Diamond
Keyword(2) Micro-fabrication
Keyword(3) n-type film
Keyword(4) Electron source
1st Author's Name Yoshiki NISHIBAYASHI
1st Author's Affiliation Semiconductor R&D Laboratories, Sumitomo Electric Industries, Ltd.()
2nd Author's Name Natsuo TATSUMI
2nd Author's Affiliation Semiconductor R&D Laboratories, Sumitomo Electric Industries, Ltd.
3rd Author's Name Akihiko NAMBA
3rd Author's Affiliation Semiconductor R&D Laboratories, Sumitomo Electric Industries, Ltd.
4th Author's Name Takahiro IMAI
4th Author's Affiliation Semiconductor R&D Laboratories, Sumitomo Electric Industries, Ltd.
Date 2004/12/9
Paper # ED2004-192
Volume (vol) vol.104
Number (no) 519
Page pp.pp.-
#Pages 4
Date of Issue