Presentation 2005/5/19
Substrates dependence of ZnO nanodots formation
Kota OKAMATSU, Satoshi NAKAGAWA, Atsushi NAKAMURA, Toru AOKI, Jiro TEMMYO,
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Abstract(in English) The ZnO films and nanodots were grown on SiO_2/Si substrate, r-plane sapphire substrate, a-plane substrate by Remote Plasma Enhanced Metal Organic Chemical Vapor Deposition (RPE-MOCVD). Diethyl Zinc (DEZn) was used for a group-II source and oxygen gas was used for a group-VI source. The size dependency of ZnO nanodot were investigated by changing the substrates and substrate temperature. Crystallographic relationship between ZnO and substrates were investigated by XRD measurement. The ZnO dot size were depended on the substrate temperature and the growth rate. Optical property of ZnO nanodots was characterized by photoluminescence measurement.
Keyword(in Japanese) (See Japanese page)
Keyword(in English) remote plasma MOCVD / ZnO / DEZn / nanodots
Paper # ED2005-25,CPM2005-17,SDM2005-25
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Committee CPM
Conference Date 2005/5/19(1days)
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Registration To Component Parts and Materials (CPM)
Language JPN
Title (in Japanese) (See Japanese page)
Sub Title (in Japanese) (See Japanese page)
Title (in English) Substrates dependence of ZnO nanodots formation
Sub Title (in English)
Keyword(1) remote plasma MOCVD
Keyword(2) ZnO
Keyword(3) DEZn
Keyword(4) nanodots
1st Author's Name Kota OKAMATSU
1st Author's Affiliation Research Institute of Electronics, Shizuoka University()
2nd Author's Name Satoshi NAKAGAWA
2nd Author's Affiliation Research Institute of Electronics, Shizuoka University
3rd Author's Name Atsushi NAKAMURA
3rd Author's Affiliation Research Institute of Electronics, Shizuoka University
4th Author's Name Toru AOKI
4th Author's Affiliation Research Institute of Electronics, Shizuoka University
5th Author's Name Jiro TEMMYO
5th Author's Affiliation Research Institute of Electronics, Shizuoka University
Date 2005/5/19
Paper # ED2005-25,CPM2005-17,SDM2005-25
Volume (vol) vol.105
Number (no) 91
Page pp.pp.-
#Pages 6
Date of Issue