Presentation 2005/5/19
Characterization of amorphous carbon thin film synthesized by nitrogen radical and methane plasma sources
Naoki KAMADA, Yasuhiko HAYASHI, Tetsuo SOGA, Takashi JIMBO,
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Abstract(in English) Conductivity of amorphous carbon (a-C) was successfully controlled by incorporation of nitrogen atoms using a double beam method (DBM), where both rf nitrogen radical and rf methane plasma sources were controlled separately to optimize the nitrogen incorporation.
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Keyword(in English) Amorphous carbon films / Nitrogen doping / Double beam method / Conductivity
Paper # ED2005-21,CPM2005-13,SDM2005-21
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Conference Information
Committee CPM
Conference Date 2005/5/19(1days)
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Registration To Component Parts and Materials (CPM)
Language JPN
Title (in Japanese) (See Japanese page)
Sub Title (in Japanese) (See Japanese page)
Title (in English) Characterization of amorphous carbon thin film synthesized by nitrogen radical and methane plasma sources
Sub Title (in English)
Keyword(1) Amorphous carbon films
Keyword(2) Nitrogen doping
Keyword(3) Double beam method
Keyword(4) Conductivity
1st Author's Name Naoki KAMADA
1st Author's Affiliation Nagoya Institute of Technology()
2nd Author's Name Yasuhiko HAYASHI
2nd Author's Affiliation Nagoya Institute of Technology
3rd Author's Name Tetsuo SOGA
3rd Author's Affiliation Nagoya Institute of Technology
4th Author's Name Takashi JIMBO
4th Author's Affiliation Nagoya Institute of Technology
Date 2005/5/19
Paper # ED2005-21,CPM2005-13,SDM2005-21
Volume (vol) vol.105
Number (no) 91
Page pp.pp.-
#Pages 5
Date of Issue